摘要
用直流反应磁控溅射法在浮法玻璃基片上制备了TiN薄膜。镀膜试样在大气环境下分别经 5 2 0℃、5 70℃和 6 2 0℃热处理 10min。用X射线光电子能谱 (XPS)得到的结果显示 ,经 5 2 0℃热处理的试样 ,TiN薄膜上出现了TiNxOy 层。经 5 70℃热处理的试样 ,TiN薄膜上的TiNxOy 成分减少 ,TiO2 的含量增加 ,6 2 0℃热处理的试样表面上主要是TiO2 。 5 70℃和 6 2
Thin films of TiN were deposited on float glass substrates by DC reactive magnetron sputtering. The heat treatment of coated glass was then carried out in a conventional furnace at 520 ℃, 570 ℃ and 620 ℃ for 10 min, respectively. The results obtained by X-ray photoelectron spectroscopy showed that the formation of thin surface overlayers (TiN xO y) on top of the TiN films was observed at heat treatment 520 ℃。Comparison of the spectrum of sample heat-treated at 520 ℃ showed that, at heat treatment 570 ℃, the intensity of the Ti2p 3/2 peak at 457.9 eV which was related to TiN xO y decreased and the intensity of the Ti2p 3/2 peak at 458.95 eV which was related to TiO 2 increased. At heat treatment 620 ℃, TiO 2 seperated on top of the TiN films. N1s signal, at heat treatment 520 ℃ and 620 ℃, showed a pronounced peak at 401.5 eV which is related to the molecular nitrogen.
基金
教育部骨干教师资助项目 (生态建筑材料 )
教育部科学技术重点项目 !(990 87)
