摘要
采用直流磁控溅射镀膜工艺,在不同的氮氩流量比条件下,制备了玻璃基Ti N薄膜。通过X射线衍射仪（XRD）、场发射扫描电子显微镜（SEM、EDS）、纳米显微硬度仪,研究了Ti N薄膜的组织结构、物相组成、表面形貌、元素成份、维氏硬度,分析了氮氩流量比对Ti N薄膜结晶取向、硬度的影响机理。结果表明,在低的氮氩流量比条件下,Ti N薄膜以（111）晶面择优取向;随着氮氩流量比增加,择优取向由（111）晶面向（200）晶面过渡;氮氩流量比为1∶2时薄膜以（200）晶面择优取向;继续增加氮氩流量比（1∶2~2∶1）,Ti N薄膜衍射峰强度降低,晶粒尺寸减小;当氮氩流量比增加到2∶1时,薄膜开始呈现非晶态。随着氮氩流量比的增加,薄膜硬度呈现先增加后减小的趋势;当氮氩流量比为1∶1时,Ti N薄膜以（200）晶面择优取向结晶,组织致密均匀,晶粒尺寸最小,具有最大的硬度值（825 HV）,相比未镀膜的玻璃基片,硬度值增加了20.44%。
TiN thin films were deposited on commom glass substrates under different N2/Ar flow ratio by DC reactive magnetron supttering. The structure, compositions of phase, morphology, element composition, Vickers hardness of TiN thin films were researched by using X-ray diffraction （XRD）, field emission scanning electron microscope （SEM, EDS）, nano-hardness tester. The mechanisms of different N2/Ar flow ratio on crystal preferential orientation and hardness of TiN thins film were discussed. The results show that when N2/Ar flow ratio was in low condition, The preferential orientation was （ 111 ）. With the increase of N2/Ar flow ratio, the preferential orientation of TiN transforms from （ 111 ） to （200）. When N2/Ar flow ratio was 1： 2, The preferential orientation was （200）. Continued to increase the N2/Ar flow ratio （ 1 ： 2 to 2 ： 1 ）, the peak intensity of the crystal weakened and size of grain decreased. When the NJAr flow ratio was 2： 1, TiN thin films Show in amorphous. With the increase of N2/Ar flow ratio, the hardness of TiN thin films increased firstly. However, when the N2/Ar flow ratio was increased continuously, the hardness of TiN thin films decreased then. When Ni/Ar flow ratio was 1 ： 1, the preferential orientation of TiN thin films was （200）, the structure was dense and uniform. And size of grain was the smallest. It had a maximum hardness （825 HV ）. Compared to ordinary glass substrates, the hardness increased by 20.44%.
出处
《硅酸盐通报》
CAS
CSCD
北大核心
2016年第12期4076-4081,共6页
Bulletin of the Chinese Ceramic Society
基金
湖北省重大科技创新计划项目(2013AAA005)
关键词
磁控溅射
玻璃基Ti
N薄膜
硬度
氮氩流量比
magnetron sputtering
TiN films deposited the glass substrate
hardness
flow ratio of N2/Ar
