摘要
以ZnAl2O4陶瓷靶为靶材,采用射频磁控溅射法制备了掺铝氧化锌(ZAO)透明导电薄膜,通过XRD、SEM、四探针仪和分光光度计等测试,研究了沉积温度对薄膜结构、形貎、力学和光电性能的影响。结果表明:ZAO具有(002)择优取向的六角纤锌矿结构,沉积温度对薄膜性能具有明显影响,当温度位于370～400℃区间时,薄膜的结晶质量较好、电阻率较低、可见光波段的平均透射率较高,其品质因数大于1.20×10-2 S,具有良好的光电综合性能。同时基于透射光谱计算了ZAO薄膜的光学常数,并用有效单振子理论解释了薄膜的折射率色散关系。
Transparent conducting aluminum-doped zinc oxide（ZAO） thin film were deposited by RF magnetron sputtering using using ZnAl2O4 as sintered ceramic target.The influence of deposition temperature on microstructure,morphology,mechanical and optoelectrical properties of ZAO films was investigated by XRD,SEM,four-point probe and spectrophotometer respectively.The results showed that the polycrystalline ZAO films consist of the hexagonal crystal structures with c-axis as the preferred growth orientation normal to the substrate,and that the deposition temperature significantly affects the crystal structures and physical properties of the films.The ZAO films prepared at the deposition temperature of 370-400 ℃ exhibit the higher synthetic optoelectrical properties,which have the relatively well crystallinity,the lower electrical resistivity,the higher average transmittance in the visible light range and the higher figure of merit（1.20 ×10-2 S）.Furthermore,the optical bandgap of the ZAO films was calculated using Tauc＇s theory,and the refractive index and extinction coefficient were determined by the envelope method.The dispersion behaviour of the refractive index was studied in terms of the single-oscillator model.
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
2011年第5期1305-1310,共6页
Journal of Synthetic Crystals
基金
湖北省自然科学基金(2009CDB166)资助项目
中南民族大学中央高校基本科研业务费专项资金(CZZ11001)项目资助
中南民族大学学术团队基金(XTZ09003)资助项目
关键词
掺铝氧化锌薄膜
磁控溅射
微观结构
光电性能
ZAO thin films
magnetron sputtering
microstructure
optoelectrical properties
