摘要
研究了薄膜的结构性质、光学和电学性质随薄膜厚度的变化关系.制备的ZnO:Al薄膜具有(002)面的单一择优取向的多晶六角纤锌矿结构,性能优良的薄膜电阻率为4.9×1 0-4Ω.cm,平均透射率达到了88%.
The thickness dependence of structural,optical and electrical properties of the ZnO:Al films on glass substrates has been studied.Good films with resistivity as low as 4.9×10-4Ω·cm and 88 % transmittance in the visible region on glass are prepared.
出处
《郑州大学学报(理学版)》
CAS
2007年第3期120-123,共4页
Journal of Zhengzhou University:Natural Science Edition
基金
重庆市教委科研基金资助项目
编号040810
关键词
直流反应磁控溅射
ZAO薄膜
厚度
光电性能
DC reactive magnetron sputtering
ZAO film
film thickness
optical and electrical property