摘要
采用近共振激光驻波场会聚铬原子沉积技术制作的原子光栅可以作为纳米级长度计量标准。基于粒子光学模型,综合考虑横向发散角、纵向速度分布以及同位素等影响因素,采用蒙特卡罗方法确定原子运动的初始条件,对激光驻波会聚原子的三维特性进行了研究。获得了不同激光功率下沉积条纹的三维结构,分析了纵向高斯激光分布和椭圆高斯激光截面对沉积条纹的影响。模拟结果表明,当激光功率为40mW时,可观测的纳米光栅图案能在基板87%区域内出现,对应于高斯光束中心处条纹半峰全宽为31nm。当高斯激光束截面为圆形时,沉积质量较好。
Periodic nanostructures fabricated by atom lithography using standing-wave light field can be applied for nanometrology. Atom-optical properties of 3D standing-wave light field are studied with particle optics model. The initial condition of each trajectory is stochastically selected with Monte-Carlo method, where the effects of isotope, longitudinal velocity distribution and transverse Gaussian divergence are systematically evaluated. 3D nanostructures with varying laser powers are presented,which shows the effect of longitudinal Gaussian distribution of the light field. The effect of elliptical standing wave is also discussed. It is shown that well-defined nano-grating lines appear in 87 % of the substrate and full width at half maximum （FWHM） obtained at the center of Gaussian laser beam is 31 nm when the laser power is 40 mW. Good results can be obtained when the shape of the cross section of the standing wave is round.
出处
《光学学报》
EI
CAS
CSCD
北大核心
2011年第11期190-194,共5页
Acta Optica Sinica
基金
国家自然科学基金(10804084)
清华大学国家重点实验室开放基金(DL_003)资助课题
关键词
激光光学
原子光刻
纳米计量
激光驻波场
蒙特卡罗方法
laser optics~ atom lithography
nanometrology
standing wave light field
Monte-Carlo method
