摘要
在氮气和氩气的混合气氛中,在不同N2分压下,用直流磁控溅射法在Si基片上沉积非晶态Ta–N薄膜。利用X射线衍射仪、原子力显微镜、台阶仪和纳米压痕仪、光学轮廓仪和扫描电子显微镜对沉积的薄膜进行表征。结果表明:不同N2分压下沉积的薄膜都有平整且致密的表面,表面均方根粗糙度都较小;随着N2分压的上升,薄膜沉积速率、纳米硬度和弹性模量都随之下降。所制备薄膜在室温、空气环境中具有稳定的滑动摩擦因数;当N2分压为混合气体的10%(体积分数)时,薄膜的摩擦因数最低,仅为0.27,但由于硬度较低,其磨损也相对较为严重。
The amorphous Ta–N thin films were deposited by direct current magnetron sputtering on silicon wafer with different N2 partial pressures in N2/Ar atmosphere.The as-prepared thin films were characterized by X-ray diffractometer,atomic force micro-scope,nanoindenter,friction test instrument,optical profilograph and scanning electron microscope.The results show that the thin films sputtered with different N2 partial pressures are smooth,dense and have smaller root mean square roughness.The depositing rate,nano-hardness and elastic modulus of the as-prepared thin films decreases with the increase of N2 partial pressure.The friction factor of the films is stable at room temperature in air.When the N2 partial pressure is 10% in volume of mixing gas,the friction fac-tor of thin film has the lowest value of 0.27.However,the film had a higher wear rate due to the lower hardness.
出处
《硅酸盐学报》
EI
CAS
CSCD
北大核心
2011年第5期843-848,共6页
Journal of The Chinese Ceramic Society
基金
江苏省自然基金(BK2008224)
江苏省高校自然科学重大基础研究(09KJA430001)
江苏省青蓝工程资助项目
关键词
氮化钽薄膜
纳米硬度
弹性模量
表面形貌
摩擦性能
tantalum–nitrogen thin films
nano-hardness
elastic modulus
surface morphology
tribological properties
