摘要
单层TaN薄膜及由柔性Ta及硬TaN层组成的多层Ta/TaN薄膜通过ECR增强直流磁控溅射在不锈钢基体上制备,所有的TaN及Ta/TaN薄膜均制备200 min。薄膜厚度及薄膜的截面形貌通过扫描电镜观测,化学结构通过XRD测试,硬度,模量,塑性及结合力分别通过纳米压痕及划痕实验进行测定。结果表明,TaN择优取向为六方(110),(300),Ta层为(110),(300)。单层TaN展现最高硬度,接近40GPa,但结合力较低。5周期的多层薄膜呈现了较高的硬度,最好的塑性及结合力。证明合适的调制周期及层数可以有效地提高薄膜的力学性能,包括硬度,塑性及结合力。
Single TaN film and Ta/TaN multilayer films,consisting of alternating ductility Ta and hard TaN layers,were synthesized on bearing steels by Electron Cyclotron Resonance(ECR)-microwave plasma source enhanced DC sputtering.All the TaN film and Ta/TaN films with different modulation were deposited for 200 min.The thickness and cross-section morphologies of films were observed by scanning electronic microscope(SEM).The chemical structures were investigated by X-ray diffraction(XRD).The hardness,modulus,plasticity and adhesion were evaluated using nano-indenter and scratch tester.The results show that the preferred orientation of TaN layers is hexagonal(110),(300),and Ta layers' is cubic(110),(300).Single TaN film shows the highest hardness of about 40 GPa,but lower adhesion strength.The multilayer film with 5 bilayers exhibits higher hardness,best plasticity and adhesion.It has been proved that appropriate modulation periods and bilayers improve the mechanical properties including the hardness,plasticity and adhesion.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2013年第S2期115-119,共5页
Rare Metal Materials and Engineering
