摘要
氧化钨薄膜具有独特的物理性质和优异的光电特性,已经成为功能材料领域研究的热点。本文综述了各种改善氧化钨薄膜变色性能的方法,阐述了各种提高氧化钨薄膜变色性能方法的作用机理,简要分析了各种方法的特点,并对今后优化氧化钨薄膜性能的发展方向予以展望。
The WO3 thin film,which has particular physical properties and excellent photoelectric properties,has been one of the most interesting functional materials.In this paper,a variety of methods to improve the properties of the allochroic WO3 thin films are introduced.Otherwise,the mechanisms of all the approaches are elaborated,whose characteristics are also present briefly.Finally,some suggestions and prospects on development directions to optimize the performance of the WO3 thin films are pointed out.
出处
《中国陶瓷》
CAS
CSCD
北大核心
2010年第11期3-6,共4页
China Ceramics
基金
国家自然科学基金资助项目
编号:50702052
关键词
氧化钨薄膜
优化
发展方向
WO3 thin films
improvement
development directions
