摘要
采用直流反应磁控溅射法在透明导电ITO玻璃上先沉积三氧化钨(WO 3)薄膜,然后在其表面沉积二氧化钛(TiO 2).利用场发射扫描电子显微镜(FE-SEM)、X射线衍射仪(XRD)和X射线光电子能谱(XPS)考察薄膜表面断面形貌、晶体结构和化学组成.利用紫外-可见-近红外分光光度计和电化学工作站测试薄膜的透射率、循环伏安和计时电流特性,分析其电致变色光学调制幅度和着色效率.结果表明沉积TiO 2后,薄膜仍为无定型结构,表面形貌无明显变化,也未出现分层现象.薄膜表面成分为TiO 2和WO 3.与纯WO 3薄膜相比,表面沉积TiO 2后降低了离子注入/脱出扩散速率,导致薄膜着色效率下降.但在驱动电压±1.2 V范围内,表现出较好的着/褪色循环稳定性,说明表面上的TiO 2可有效地抑制WO 3薄膜性能衰减,对薄膜表面起到保护作用.
Tungsten trioxide(WO3)thin film was firstly deposited by DC reactive magnetron sputtering on ITO glass and then titanium dioxide(TiO2)was deposited on its surface.The surface and cross-section morphology,crystalline structure and chemical composition of the film were characterized by field emission scanning electron microscopy(FE-SEM),X-ray diffractometry(XRD)and X-ray photoelectron spectroscopy(XPS).The UV-Vis-NIR spectrophotometer and electrochemical workstation were used to investigate the transmittance,cyclic voltammetry and chronograph current of the films.The optical modulation amplitude and coloration efficiency were analyzed.The results show that the film is amorphous.The surface morphology does not change obviously,and no delamination appears.The surface is composed with TiO2 and WO3.Compared with the pure WO3 film,the presence of surface TiO2 reduces the ion injection/extraction diffusion rate,resulting in relatively poor colorization efficiency.However,under the driving potential range of±1.2 V,it presents better colored/bleached cyclic stability,which means TiO2 effectively inhibits the performance degradation of WO3 film and protects the surface of the WO3 thin film.
作者
王美涵
陈昀
雷浩
黄奕博
文哲
马佳玉
WANG Meihan;CHEN Yun;LEI Hao;HUANG Yibo;WEN Zhe;MA Jiayu(School of Mechanical Engineering,Shenyang University,Shenyang 110044,China;Institute of Metal Research,Chinese Academy of Sciences,Shenyang 110016,China)
出处
《沈阳大学学报（自然科学版）》
CAS
2019年第5期355-361,共7页
Journal of Shenyang University：Natural Science
基金
国家自然科学基金资助项目(51302175)
辽宁省自然科学基金资助项目(20180550727)
