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沉积温度对纳米ZnO薄膜的结构和光电性能的影响 被引量:1

Effects of Deposition Temperature on the Structure and Optoelectronic Properties of Nanocrystalline ZnO Films
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摘要 采用阴极电沉积的方法,用ZnCl2的二甲基亚砜溶液做电解液,在导电玻璃上制备了纳米ZnO薄膜。研究了沉积温度对薄膜结构特性和光电性能的影响。XRD分析表明,ZnO薄膜为纤锌矿结构,电解液温度的升高能促进纳米ZnO薄膜的(002)面(c轴)择优取向的程度。随着电解液温度的升高,薄膜的禁带宽度和面电阻减小。光学测试表明样品的透射率可高达80%以上,电学测试表明样品的面电阻值最小可达7.57×104Ω/□。AFM显示电解液温度对ZnO晶粒形貌及晶粒大小的影响很大。 Nanocrystalline ZnO films were grown by galvanostatic cathodic electrodeposition from dimethyl sulfoxide solutions containing ZnCl2 on ITO substrates.The influence of deposition temperature on the structural,optical and electrical properties of the ZnO films was studied.XRD shows the ZnO films are of hexagonal wurtzite structure,and the texturation of the films along c direction is enhanced while the band gap and sheet resistivity decrease with the increase of electrolyte temperature.Optical characterizations show that the ZnO films prepared at the temperature below 180℃ obain a high optical transmittance up to 80% in the visible wavelength range.A lower sheet resistivity of about 7.57×104Ω/□can be obtained for the ZnO films prepared under optimum deposition conditions.The AFM pictures indicate that the electrolyte temperature has a significant effect on the grain shape and size of nanocrystalline ZnO films.
作者 岳兰 孟繁新
出处 《半导体光电》 CAS CSCD 北大核心 2010年第5期758-762,共5页 Semiconductor Optoelectronics
基金 通化师范学院自然科学科研项目(200927)
关键词 电沉积 ZNO XRD谱图 光学性质 电学性质 electrodeposition znic oxide X-ray diffraction optical properties electrical properties
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