摘要
利用磁控溅射法制取了MoS_2薄膜,通过X光电子能谱、X射线衍射和AFM/FFM方法对薄膜的表面形貌、成分、化学价态、结构和微观摩擦磨损性能进行了研究.实验结果表明:MoS_2薄膜表面呈蠕虫状,微观结构为(100)面平行于基面的非晶态,表面膜由MoS_2和少量的MoO_3组成.在微观摩擦磨损过程中,MoS_2薄膜的摩擦系数较大,且而磨性能高;微摩擦过程中没有磨合阶段,不存在摩擦机理的转变.
MoS2 thin film was deposited by magnetron sputtering methods on the surface of single crystalline silicon. The morphology, composition, bonding energy, structure and microtribological properties were studied by PHI - 5300, XRD and atomic force/friction force microscope. The results show that the characters of MoS2 morphology was acicular or worm - like island, (100) plane were found parallel to the substrate. The MoS2 thin film was composed of MoS2 and small amount of MoO3. The friction coefficient of MoS2 film in microtribological process was 0.11. There was no obvious worn track under the load below 130nN and 50 scanning cycles. In the microtribological process, the running - in period and transition of friction mechanism were not observed.
出处
《润滑与密封》
CAS
CSCD
北大核心
1999年第2期25-27,共3页
Lubrication Engineering
基金
国家自然科学基金 No.59575032
清华大学磨擦学重点实验室开放基金
校青年基金
中国博士后基金
国防科工委微机理研究专项青年基金资助项目
