摘要
图形化技术是微纳制造过程的核心工艺之一.目前,作为微纳加工主流工艺的光学光刻技术由于受曝光波长衍射极限的物理限制,其技术复杂性和设备制造成本大幅增加.纳米压印将传统的模板复型原理应用到微观制造领域,以其高分辨率、高效率、低成本和工艺过程简单的特点,引起了各国研究人员的广泛关注.作为一种接触式几何约束流变成形方式,纳米压印必然衍生出许多新的挑战性问题.在阐述纳米压印工艺构成要素的基础上,对目前的若干主要压印技术工艺变种进行了简要综述,总结出了纳米压印所涉及的基本理论问题,并对纳米压印在集成电路制造中所面临的挑战进行了分析.
Patterning is one of the critical processes in micro-and nano-manufacturing.As a dominant nano-fabrication process,the conventional optical lithography techniques have reached their limits in resolution,and a shorter wavelength of exposure light is needed for generating sub-100nm structures,which tends to make the patterning system more complicated and expensive.The nanoimprint lithography,which realizes pattern transfer by a mold replicating process,has drawn serious attention due to its higher resolution and cost-effectiveness.As a geometric constraint rheoforming process,the nanoimprint lithography brings about many technical challenges.In this paper,the processes are described firstly and then a state-of-the-arts review is presented.Furthermore,the fundamental issues involved in the nanoimprint lithography and the technical challenges faced in application of this process for fabricating the integrated circuit are discussed.
出处
《青岛理工大学学报》
CAS
2010年第1期9-15,共7页
Journal of Qingdao University of Technology
基金
国家自然科学基金项目(50275118)
山东省自然科学基金重点项目(ZR2009FZ007)
泰山学者建设工程专项经费资助
关键词
微纳制造
纳米压印光刻
研究进展
技术挑战
micro-nano manufacturing nanoimprint lithography research progress technical challenge
