摘要
采用傅里叶红外光谱测试技术,研究快速热处理(RTP)和常规热处理(CFP)对表面铜玷污单晶锗红外透过率的影响。结果表明:样品的红外透过率随热处理温度的上升呈增大趋势。样品经过短时间抛光后,红外透过率恢复至初始大小。分析表明Cu-Ge的互扩散及界面反应是造成透过率改变的主要原因。
The annealing effect of thermal treatment by rapid thermal processing （RTP） and conven- tional furnace processing （CFP） on the IR transmittance of copper-contaminated single crystalline germani- um is investigated by FTIR. It is found that the transmittance increases with the increasing annealing tem- perature. Based on our experiments, the differences in the IR transmittance may be caused by the forma- tion of Cu-Ge alloy.
出处
《浙江理工大学学报（自然科学版）》
2010年第2期269-271,282,共4页
Journal of Zhejiang Sci-Tech University(Natural Sciences)
关键词
常规热处理
快速热处理
红外透过率
单晶锗
conventional furnace processing
rapid thermal processing
IR transmittance
single-crystalline germanium
