摘要
为有效利用半导体晶圆蚀刻系统,根据蚀刻系统的特点,进行了实时调度问题域的描述,提出了基于驻留约束的实时调度算法.在此基础上,建立了以无不良品和总完工时间最小为目标的启发式实时调度算法.仿真实验结果表明,该算法是有效和实用的.
A wet-etching process is a key flow in wafer fabrications. The wet-etching process involves a complex interplay operation of zero wait and no-intermediate storage, and shared robots. To improve the utilities of a semiconductor wafer wet-etching system efficiently, according to characteristics of the wet-etching system, a problem domain of the real-time scheduling was supposed and defined, and strategies of resolving the scheduling problem were proposed. A real-time scheduling algorithm with residence constraints was presented as well. On the basis of the mentioned above, a heuristic real-time algorithm were built for minimizing makespan with no defective wafer. Finally, the performances of the proposed algorithm were analyzed with simulation experiments. The results indicate that the proposed algorithm is valid and practical for generating satisfactory schedule solutions.
出处
《上海交通大学学报》
EI
CAS
CSCD
北大核心
2009年第11期1742-1745,1750,共5页
Journal of Shanghai Jiaotong University
基金
国家自然科学基金资助项目(60574054
70771065)
上海市浦江人才计划资助项目(07PJ14052)
关键词
蚀刻系统
半导体晶圆制造
实时调度
驻留约束
etching systems
semiconductor wafer fabrications
real-time scheduling
residence constraints
