摘要
利用电弧离子镀技术在铀表面制备了TiN单层膜、梯度膜和Ti/TiN多层薄膜,并进行了Cl-腐蚀和极化实验。结果表明:性能最好的-800V脉冲偏压下,样品在50μg/gCl-溶液中,Ecorr升高了～714mV,Icorr降低了～2个数量级。单层膜、梯度膜为贯穿基体的缺陷失效,抗腐蚀性能差;而多层膜提高抗腐蚀性能源于层状失效,腐蚀介质到达基体更加困难,抗腐蚀性能优良。
Multi-layered Ti/TiN films, single layer TiN films and gradient TiN films were deposited on uranium substrates by arc ion plating. The anodie polarization experiments in 50 μg/g Cl^- solution indicate that Ecorr of the sample at a pulse bias of-800 V increases to about 714 mV, with an Icorr decrease of about two orders of magnitude. Studying on electrochemical corrosion mechanisms indicates that single layer films and gradient films become inactive by defect penetration through the subsrrate, hence decreased corrosion-resistance; while the inactivation of multi-layer films is due to layer malfunction, which makes it difficult for corrosive substances to reach the substrate. In this way the corrosion resistance is enhanced.
出处
《核技术》
CAS
CSCD
北大核心
2009年第11期823-827,共5页
Nuclear Techniques
基金
中国工程物理研究院发展行业基金(2007B07003)资助
关键词
铀
Ti-N薄膜
耐蚀
Uranium, Ti-N films, Corrosion resistance
