摘要
采用双靶反应磁控溅射的方法,通过改变基体相对于靶材的位置制备了一系列不同化学成分的W1-xTixN薄膜。用X射线衍射仪,扫描电子显微镜,能量散色谱等检测手段对薄膜的表面状态,化学成分以及结构等进行了表征,采用UMT-3型多功能摩擦磨损试验机,在室温、大气环境、无润滑的条件下对不同成分WTiN薄膜的摩擦学性能进行了评价。试验结果表明:薄膜的化学成分伴随着位置的改变在W0.80Ti0.20N和W0.18Ti0.82N的范围内发生变化;在经历了800℃,1 h的退火以后不同位置制备的薄膜先后出现了TiN,TiN0.6O0.4,W2N,W等多种物相结构;随着Ti含量的增加,薄膜的纳米硬度最高可达29.8 GPa,弹性模量最高可达277.5 GPa。一系列摩擦数据显示x=0.52的薄膜在所制备的WTiN薄膜体系中拥有最佳的摩擦学性能。
The W-Ti-N coatings, with varied contents, were deposited by double-target co-sputtering on 40Cr steel substrates. The impacts of the coating conditions on its mechanical properties were studied. The microstructures and chem- ical compositions were characterized with X-ray diffraction, scanning electron microscopy energy dispersive spectroscopy and conventional mechanical probes. The results show that the variance in its contents, ranging from W0.80Ti0.20N to W0.18 Ti0.82N by changing the orientation and position of the substrate with respect to the targets, significantly affects its tribelogical property. For example, after annealing at 800℃ for 1 hour, the phases of TiN, TiN0.600.4, W2N and W were ob- served in the amorphous coatings; as Ti content increases, its nano-hardness and its elastic modulus increase to 29.8 GPa and 277.5 GPa, respectively. When x = 0.52, the WTiN coating displays the best triboligical property.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2010年第3期249-253,共5页
Chinese Journal of Vacuum Science and Technology
关键词
W-Ti-N薄膜
反应磁控溅射
基体位置
摩擦磨损性能
W-Ti-N films, Reactive magnetron sputtering, Substructure position, Friction and wear behavior
