摘要
通过对Varian3180磁控溅射台溅射的Al-Sil％合金膜工艺的研究，得到了满足工艺线要求的工艺条件，完成了大规模集成电路的金属化要求，从而提高了集成电路的高可靠性。
The Al-Si film magnctics sputter technology was studied in this paper by the Varian 3180 sputter system. We obtained the processing condition meeting the need of processing line. The metallization of the LSI was per formed and the reliability of the military IC was proved.
出处
《微处理机》
1998年第2期15-16,共2页
Microprocessors
