摘要
利用电子束光刻、X射线光刻和微电镀技术,成功制作了面积为1 mm×1 mm,周期为300 nm,金吸收体厚度为1μm的用于X射线显微成像的透射光栅。首先,利用电子束光刻和微电镀技术在Si3N4薄膜上制作周期为300 nm,厚度为250 nm的高线密度光栅掩模;然后,利用X射线光刻和微电镀技术复制厚度为1μm,占空比接近1∶1,高宽比为7的X射线透射光栅。整个工艺流程充分利用了电子束光刻技术制作高分辨率图形和X射线光刻技术制作大高宽比结构的优点,实现了大高宽比、纳米尺度、侧壁陡直的X射线透射光栅的制作。
A transmission grating with an area of 1 mm× 1 mm, a pitch of 300 nm, and a gold thickness of 1um for X-ray imaging and microscopy is successfully fabricated by combining electron beam lithography, X ray lithography, and electroplating. Firstly, a high-density mask in pitch of 300 nm and gold thicknes of 250 nm for transmission grating is originally patterned on the Si3N4 membranes by electron beam lithography and electroplating. Then, the X-ray lithography and electroplating are used to replicate the transmission grating with the profile thickness of 1um, aspect ratio of 7, and the duty cycle about 1 ： 1. Experimental results show that the fabrication method combining electron beam lithography,X-ray lithography and electroplating has advantages over other fabrication methods in big pitch,nanometer scale and straight side well for transmission grating.
出处
《光学精密工程》
EI
CAS
CSCD
北大核心
2009年第1期72-77,共6页
Optics and Precision Engineering
基金
国家自然科学基金资助项目(No.10675113No.10734070)
