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光辅助对MOCVD法制备ZnO薄膜性能的影响 被引量:7

Study on the Properties of ZnO Films Prepared by Photo-assisted MOCVD
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摘要 采用光辅助金属有机化学气相沉积(MOCVD)技术在(0001)蓝宝石衬底上制备了ZnO薄膜。通过X射线衍射、透射光谱和霍尔测试等研究了光照对MOCVD法制备的ZnO薄膜的影响。实验结果表明,引入光辅助后制备的ZnO薄膜,其结晶质量和光学质量均得到改善。分析认为,这主要是由于光辅助有助于提高锌有机源的分解效率,并且高能量的光子可为反应吸附的原子提供足够高的激活能,从而易于其迁移到合适的晶格位置所致。同时我们还发现,有光照和无光照条件下制备的ZnO薄膜均呈n型导电,但有光照条件下制备的ZnO薄膜具有更低的本底载流子浓度,这将为日后通过降低自补偿实现p型掺杂提供一个很好的解决办法。 ZnO films were grown on (0001) Al2O3 substrates by photo-assisted Metal Organic Chemical Vapor Deposition (PA-MOCVD). The effects of photo-assisted on the properties of ZnO films were studied by X-ray diffraction, transmission spectrum and Van der Pauw Hall effect, respectively. The results indicated that the samples prepared under photo irradiation have better crystal and optical quality, and they have lower electron concentration. The light irradiation during the growth of ZnO films is benefit for the decompositon of metal organic source, and can afford enough energy for these adsorption atoms migrating to proper lattice position.
出处 《发光学报》 EI CAS CSCD 北大核心 2008年第1期139-143,共5页 Chinese Journal of Luminescence
基金 国家自然科学基金资助项目(60576054,50532080)
关键词 氧化锌薄膜 光辅助金属有机化学气相沉积 光学特性 ZnO thin film photo-assisted MOCVD optical property
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