摘要
介绍了适用薄膜残余应力测量的弯曲法和X射线掠射法,重点介绍了一种新型测量薄膜残余应力的方法—纳米压痕法,并采用非球形压头纳米压痕法测量了NiTi薄膜的残余应力,对薄膜残余应力的测量进行了有益的探讨和尝试,结果表明纳米压痕技术可作为定性测量薄膜残余应力的有效手段。
This paper introduced the methods for estimating residual stresses of thin films. They are X-ray glancing, contour method and nanoindentation method. NiTi thin films on silicon wafer were prepared by magnetron sputter-deposited method. The residual stress of NiTi thin films was measured by the three methods. The experimental results show that the nanoindentation method can be used to estimate the residual stresses of thin films qualitatively.
出处
《实验室研究与探索》
CAS
2007年第1期16-18,共3页
Research and Exploration In Laboratory
基金
上海市科委基金项目(编号:0452nm054)
