摘要
提出了将激光辅助化学刻蚀技术应用于钇钡铜氧(YBCO)高温超导薄膜的刻蚀,研究了无掩膜YBCO薄膜激光化学刻蚀的表面特性及其变化规律,为YBCO激光化学刻蚀技术中图形形状控制、刻蚀时间选择和激光功率调节等提供了重要的实验结论。研究发现:在激光辐照下,YBCO薄膜的液相刻蚀速率大大加快,将极大改善刻蚀中的横向钻蚀情况,并提高图形边缘的侧壁陡峭度,且整个过程中的刻蚀速率呈现加快趋势;无掩膜时,YBCO表面刻蚀程度持续过渡,激光光斑边界两侧并非严格分界;衬底铝酸镧(LaAlO3)的晶向对YBCO薄膜的表面刻蚀特征有较大影响,沿LaAlO3晶向方向的刻蚀程度高于非晶向方向。
The laser assisted chemical etching was proposed to apply in the etching of YBCO high temperature superconductor （HTS） film, which was a significant application involving superconductor electronics, laser technique and chemistry. The etched surface characteristics and variations were studied,and important experimental results were provided to control the figure shape,etching period and laser power. The major conclusions include：the wet etching speed of YBCO film was accelerated drastically under laser radiation and increased over time;there was no strict distinction at the edge of laser facula and the surface etching degree of YBCO film transited gradually;the etched surface characteristic was greatly influenced by the crystal direction of LaAlO3 substrate and the etching effect was higher along crystal direction.
出处
《光电子．激光》
EI
CAS
CSCD
北大核心
2007年第3期296-298,共3页
Journal of Optoelectronics·Laser
基金
国家"863"项目基金资助项目(2002AA306421)
电子科技大学校青年基金资助项目(JX05010)
