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磁控溅射制备TiO_2薄膜的抗凝血性能 被引量:1

Anticoagulant Property of TiO_2 Thin Films Prepared by Magnetron Sputtering
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摘要 用射频磁控溅射法在生物玻璃基片上沉积TiO_2薄膜。通过研究基片温度和热处理对薄膜表面抗凝血性能的影响,比较了基片沉积薄膜前后抗凝血性能的变化,结果发现,在基片温度为500℃制得的TiO2薄膜的抗凝血性能较好,而导致薄膜表面抗凝血性能变化的主要原因在于薄膜表面能、表面结构和形貌的变化。 TiO2 thin films are prepared by RF magnetron sputtering on the bioglass substrates. The influence of substrate temperature and annealing on anticoagulation property, and the change of anticoagulation property after and before preparing films are analyzed. The results show TiO2 thin films prepared at the substrate temperature of 500℃ have superior anticoagulation property. The analysis shows the anticoagulation property of TiO2 thin films depends mostly on the change of surface energy, microstructure, and morphology.
出处 《材料导报》 EI CAS CSCD 北大核心 2007年第1期145-147,共3页 Materials Reports
基金 大连理工大学三束材料改性国家重点实验室资助项目(50240420656)
关键词 TIO2薄膜 磁控溅射 抗凝血性能 TiO2 thin films, magnetron sputtering, anticoagulation property
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