摘要
研究了添加稀土La电沉积电磁屏蔽N i-P合金镀层的工艺。在正交试验的基础上分析了镀液组成及电流密度对沉积速率的影响,综合考察了镀层表面质量及镀层与基体的结合力。结果表明:在镀液中加入微量稀土La,金属离子的沉积速率,镀层与基体的结合力,镀液的分散能力,镀层的表面质量都有不同程度的提高,并由此得出工艺的最佳镀液组成和操作条件。
The plating process of rare earth element lanthanum doped amorphous Ni-P alloy electromagnetic shielding coating electrodeposition was studied. The effect of the plating bath compowere improved in varying degrees while a small amount of lanthanum was doped in the plating bath. The optimism plating bath composition and operation conditions of such technology are proposed.
出处
《电镀与精饰》
CAS
2006年第2期5-9,共5页
Plating & Finishing
基金
安徽省自然科学基金资助项目(050440603)
关键词
稀土
NI-P合金
沉积速率
电磁屏蔽
rare earth
nickel-phosphoros alloy
plating speed
electromagnetic shielding
