摘要
采用融熔法制备球冠形的光致抗蚀剂掩膜，用离子束刻蚀实现球冠形向硅片上转移，有效地在较低衬底温度下（低于２００℃）制备出了硅微透镜阵列。通过扫描电子显微镜（ＳＥＭ）和表面探针实验证实了微透镜为球冠形。
A mask of spherical for microlens array has been manufactured by melting photoresist,and the spherical shapes have been ransferred onto a silicon substrate by using ion beam milling.The experiments show that the microlens arrays can be effectivly formed at low substrate temperature of less than 200℃.The spherical shapes of the silicon microlens array were observed by both scanning electron microscope (SEM) and surface stylus measurement
出处
《半导体光电》
CAS
CSCD
北大核心
1996年第2期137-140,共4页
Semiconductor Optoelectronics
关键词
微透镜阵列
硅
离子束刻蚀
Semiconductor Technology
Microlens Array
Silicon
Ion Beam Milling
