摘要
介绍了一种电子束曝光机图形发生器模数转换器的设计方案,该设计方案以ADI公司的模数转换芯片AD9223为核心,根据电子束曝光机背散射信号的特点,设计了合理的前端放大器和驱动电路及基准源。这样,提供了与DSP的无缝接口并提高了转换速度。该模数转换器可用于电子束和离子束曝光机中的图形发生器采集标记数据和图像数据信息,同时也可用于原子力显微镜采集图像数据信息。
A new analog-digital converter used in the pattern generator of e-beam lithography system is designed.The key device of the design is the A/D converter chip AD9223 of ADI Corp.The pre-amplifier,driving circuit and reference sources are suitably designed according to the characteristic of back-scattering signals.It provides seamless interface to DSP and increases the converting speed.It can also be used in focused ion beam system and AFM to collect mark data and image information.
出处
《微细加工技术》
2004年第2期8-10,16,共4页
Microfabrication Technology
