摘要
分析研究复合碳膜的制备及场发射效果。在陶瓷衬底上磁控溅射一层金属钛,对金属钛层进行仔细研磨,放入微波等离子体化学气相沉积腔中,在镀钛陶瓷衬底上制备出碳膜。利用扫描电镜、x射线衍射、拉曼光谱分析复合碳膜的微观结构和微观表面形态,表明此碳膜是含有碳纳米管、非晶碳和球状微米金刚石颗粒的复合碳膜。用二极管型结构测试了复合碳膜的场致发射电子的性能。首次发光的电场为0.75V/μm,稳定发光2.56V/μm的电场下,复合碳膜阴极发射电流密度为7.25mA/cm2。并对其复合碳膜制备成因及发射机理进行了研究。
With focus on preparation and Field Emission Effect.,carbon complex films were fabricated by microwave plasma chemical vapor deposition(MPCVD)method.The ceramic with a Ti buffer layer was used as substrate.The carbon complex films,which were combined by carbon nanotube,amphor carbon,the globe-like diamond microcrystalline-aggregates,were evaluated by Raman scattering spectroscopy,x-ray diffraction spectrum(XRD)and scanning electron microscope(SEM).The field emission properties were tested by using a diode structure in a vacuum.A phosphor-coated indium tin oxide(ITO)anode was used for observing and characterizing the field emission.It was found that carbon complex films exhibited good electron emission properties.The turn-on field was only 0.75V/μm and the emission current density as high as 7. 25mA/cm2was obtained under an applied field of 2.56V/μm for the last operation.The growth mechanism and field emission properties of the carbon complex films are discussed relating to microstructure and electrical conductivity.
出处
《光电子技术》
CAS
北大核心
2014年第1期1-4,15,共5页
Optoelectronic Technology
基金
教育部科学技术重点资助项目(205091)
河南省高等学校青年骨干教师资助计划项目(教高〔2011〕550号)
