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球状微米金刚石的制备过程及其场发射性能的研究 被引量:1

Preparation process and field emission properties of globular micron diamond
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摘要 在纯平的陶瓷衬底上面,利用磁控溅射方法镀上一层金属钛。对金属钛层进行表面缺陷处理后,放入微波等离子体化学气相沉积腔中,利用正交实验方法制备出场发射性能最优的薄膜,通过扫描电镜、X射线衍射仪、拉曼光谱仪等仪器,研究了薄膜的微观表面形态、结构组成等,得到了该薄膜是球状微米金刚石薄膜的结论。并进一步研究了最优场发射薄膜的发射机理。 A layer of thick metal titanium is plated on the flat ceramic substrate by the method of magnetron sputtering. After processing, the surface defect of metal titanium layer put in the cavity of microwave plasma chemical vapor deposition. Using the method of orthogonal experiment, the thin film of best emission is prepared. By scanning electron microscopy, X-ray diffraction instrument, Raman spectroscopy instrument, the thin film is analyzed. The conclusion of the film is globular micron diamond film. And the film mechanism of field emission is studied.
作者 高金海 张武勤 李桢 张兵临 GAO Jin-hai ZHANG Wu-qin LI Zhen ZHANG Bin-lin(College of Physics and Electronic Engineering, Zhengzhou Normal University, Zhengzhou 450044, China Physics Engineering College, Zhengzhou University , Zhengzhou 450252 ,China)
出处 《液晶与显示》 CAS CSCD 北大核心 2016年第9期877-881,共5页 Chinese Journal of Liquid Crystals and Displays
基金 教育部科学技术重点资助项目(No.205091) 河南省科学技术成果项目(教高豫科鉴委字〔2015〕第569号) 河南省高等学校重点科研项目(项目编号:16A140039)~~
关键词 球状微米金刚石薄膜 场致电子发射 微波等离子体化学气相沉积 globularmicron diamond films field emission chemical vapor deposition
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参考文献7

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