摘要
该文主要介绍一种制造太阳电池的选择性扩散新工艺,采用印刷电极的方法在硅片上的电极位置印刷高 磷浆料,然后在整个硅片表面喷涂一层浓度较低的磷源,放入高温炉中扩散后形成电极下具有较高的表面掺杂浓 度(-1020／cm3),电极间具有相对较低的表面掺杂浓度(-1019／cm3)。这样在电极下及具附近将构成一个浓度差结。 这种发射极结构有利于减小发射区复合电流、提高短波响应、作好欧姆接触和提高太阳电池的开路电压等优点。
The innovatory technology of selective diffusion for crystalline silicon solar cells was described.The phosphoric paste of high concentration was printed at the electrode-site in silicon. Afterwards, a thin layer of phosphoric source was sprayed on the surface of the whole silicon wafer. Heavily doping high surface concentration (-1020/cm3) under the electrode-site would form after diffusion at high temperature. At the same time,lightly doping and low concentration ( - 1019/ cm3) among the electrode-sites w...
出处
《太阳能学报》
EI
CAS
CSCD
北大核心
2005年第5期635-638,共4页
Acta Energiae Solaris Sinica
关键词
太阳电池
磷浆
选择性扩散
solar cell
phosphoric paste
selective diffusion
