论述了光学相控阵的原理,回顾了光学相控阵的发展历程,特别是近年来硅光子相控阵的研究进展。利用与互补金属氧化物半导体(CMOS)工艺线相兼容的绝缘体上硅(SOI)技术实现了大规模的集成,目前国外报道的最大的硅光子相控阵集成了4096个阵...论述了光学相控阵的原理,回顾了光学相控阵的发展历程,特别是近年来硅光子相控阵的研究进展。利用与互补金属氧化物半导体(CMOS)工艺线相兼容的绝缘体上硅(SOI)技术实现了大规模的集成,目前国外报道的最大的硅光子相控阵集成了4096个阵元。在硅光子上实现的二维光束扫描角度可以达到46°×36°,光束宽度只有0.85°×0.18°,天线的损耗小于3 d B,且旁瓣抑制大于10 d B。此外,采用微机电系统(MEMS)器件实现的光学相控阵的光束扫描速度超过0.5 MHz。阐述了各种方式实现光学相控阵的优缺点,并对未来发展前景进行了展望。最后,介绍了光学相控阵在激光雷达、成像、军事上的应用。展开更多
On-chip stimulated Brillouin scattering(SBS)has attracted extensive attention by introducing acousto-optic coupling interactions in all-optical signal processing systems.A series of chip-level applications such as Bri...On-chip stimulated Brillouin scattering(SBS)has attracted extensive attention by introducing acousto-optic coupling interactions in all-optical signal processing systems.A series of chip-level applications such as Brillouin lasers,amplifiers,gyroscopes,filters,and nonreciprocal devices are realized based on Brillouin acousto-optic interaction.Here,we first introduce the fundamental principle of SBS in integrated photonics and a method for calculating Brillouin gain;then we illustrate the Brillouin effect on different material platforms with diverse applications.Finally,we make a concise conclusion and offer prospects on the future developments of on-chip SBS.展开更多
提出了一种新的等效折射率方法,可以将光波导的两维折射率分布精确等效成一维折射率分布。从波动方程出发,通过严格的数学推导,得到了一维等效折射率分布的表达式。该等效折射率分布由二维光波导的模场分布和折射率分布决定。在此等... 提出了一种新的等效折射率方法,可以将光波导的两维折射率分布精确等效成一维折射率分布。从波动方程出发,通过严格的数学推导,得到了一维等效折射率分布的表达式。该等效折射率分布由二维光波导的模场分布和折射率分布决定。在此等效过程中,几乎无任何近似,因此具有比传统等效折射率方法(EIM)更高的精度,而且不受波导截止条件的限制,并适用于任意的折射率分布结构。以SOI(silicon on insulator)脊型光波导为例,给出新方法的一个具体等效实施过程,比较了新方法与传统等效折射率方法计算得到的等效模场分布及等效折射率,结果显示本文方法的有更高的计算精度。最后,文中给出了一个利用这种等效方法计算弯曲波导损耗的例子。新方法可以使对三维结构(截面为任意折射率分布)的模拟简化成二维模拟。展开更多
The integration between infrared detection and modern microelectronics offers unique opportunities for compact and high-resolution infrared imaging.However,silicon,the cornerstone of modern microelectronics,can only d...The integration between infrared detection and modern microelectronics offers unique opportunities for compact and high-resolution infrared imaging.However,silicon,the cornerstone of modern microelectronics,can only detect light within a limited wavelength range(<1100 nm)due to its bandgap of 1.12 eV,which restricts its utility in the infrared detection realm.Herein,a photo-driven fin field-effect transistor is presented,which breaks the spectral response constraint of conventional silicon detectors while achieving sensitive infrared detection.This device comprises a fin-shaped silicon channel for charge transport and a lead sulfide film for infrared light harvesting.The lead sulfide film wraps the silicon channel to form a“three-dimensional”infrared-sensitive gate,enabling the photovoltage generated at the lead sulfide-silicon junction to effectively modulate the channel conductance.At room temperature,this device realizes a broadband photodetection from visible(635 nm)to short-wave infrared regions(2700 nm),surpassing the working range of the regular indium gallium arsenide and germanium detectors.Furthermore,it exhibits low equivalent noise powers of 3.2×10^(-12) W·Hz^(-1/2) and 2.3×10^(-11) W·Hz^(-1/2) under 1550 nm and 2700 nm illumination,respectively.These results highlight the significant potential of photo-driven fin field-effect transistors in advancing uncooled silicon-based infrared detection.展开更多
SOI (silicon-on-insulator) is a new material with a lot of important perform- ances such as large index difference, low transmission loss. Fabrication processes for SOI based optoelectronic devices are compatible with...SOI (silicon-on-insulator) is a new material with a lot of important perform- ances such as large index difference, low transmission loss. Fabrication processes for SOI based optoelectronic devices are compatible with conventional IC processes. Having the potential of OEIC monolithic integration, SOI based optoelectronic devices have shown many good characteristics and become more and more attractive recently. In this paper, the recent progresses of SOI waveguide devices in our research group are presented. By highly effective numerical simulation, the single mode conditions for SOI rib waveguides with rectangular and trapezoidal cross-section were accurately investigated. Using both chemical anisotropic wet etching and plasma dry etching techniques, SOI single mode rib waveguide, MMI coupler, VOA (variable optical attenuator), 2×2 thermal-optical switch were successfully designed and fabricated. Based on these, 4×4 and 8×8 SOI optical waveguide integrated switch matrixes are demonstrated for the first time.展开更多
A rearrangeable nonblocking thermo-optic 4×4 switching matrix,which consists of five 2×2 multimode interference-based Mach-Zehnder interferometer(MMI-MZI) switch elements,is designed and fabricated.The minim...A rearrangeable nonblocking thermo-optic 4×4 switching matrix,which consists of five 2×2 multimode interference-based Mach-Zehnder interferometer(MMI-MZI) switch elements,is designed and fabricated.The minimum and maximum excess loss for the matrix are 6.6 and 10.4dB,respectively.The crosstalk in the matrix is measured to be between -12 and -19.8dB.The switching speed of the matrix is less than 30μs.The power consumption for the single switch element is about 330mW.展开更多
文摘论述了光学相控阵的原理,回顾了光学相控阵的发展历程,特别是近年来硅光子相控阵的研究进展。利用与互补金属氧化物半导体(CMOS)工艺线相兼容的绝缘体上硅(SOI)技术实现了大规模的集成,目前国外报道的最大的硅光子相控阵集成了4096个阵元。在硅光子上实现的二维光束扫描角度可以达到46°×36°,光束宽度只有0.85°×0.18°,天线的损耗小于3 d B,且旁瓣抑制大于10 d B。此外,采用微机电系统(MEMS)器件实现的光学相控阵的光束扫描速度超过0.5 MHz。阐述了各种方式实现光学相控阵的优缺点,并对未来发展前景进行了展望。最后,介绍了光学相控阵在激光雷达、成像、军事上的应用。
基金supported by the National Natural Science Foundation of China(Nos.61875063 and 62175074)。
文摘On-chip stimulated Brillouin scattering(SBS)has attracted extensive attention by introducing acousto-optic coupling interactions in all-optical signal processing systems.A series of chip-level applications such as Brillouin lasers,amplifiers,gyroscopes,filters,and nonreciprocal devices are realized based on Brillouin acousto-optic interaction.Here,we first introduce the fundamental principle of SBS in integrated photonics and a method for calculating Brillouin gain;then we illustrate the Brillouin effect on different material platforms with diverse applications.Finally,we make a concise conclusion and offer prospects on the future developments of on-chip SBS.
文摘 提出了一种新的等效折射率方法,可以将光波导的两维折射率分布精确等效成一维折射率分布。从波动方程出发,通过严格的数学推导,得到了一维等效折射率分布的表达式。该等效折射率分布由二维光波导的模场分布和折射率分布决定。在此等效过程中,几乎无任何近似,因此具有比传统等效折射率方法(EIM)更高的精度,而且不受波导截止条件的限制,并适用于任意的折射率分布结构。以SOI(silicon on insulator)脊型光波导为例,给出新方法的一个具体等效实施过程,比较了新方法与传统等效折射率方法计算得到的等效模场分布及等效折射率,结果显示本文方法的有更高的计算精度。最后,文中给出了一个利用这种等效方法计算弯曲波导损耗的例子。新方法可以使对三维结构(截面为任意折射率分布)的模拟简化成二维模拟。
基金supported by the National Key R&D Program of China(2017YFE0131900)the Natural Science Foundation of Chongqing,China(CSTB2023NSCQ-LZX0087)the National Natural Science Foundation of China(62204242,62005182).
文摘The integration between infrared detection and modern microelectronics offers unique opportunities for compact and high-resolution infrared imaging.However,silicon,the cornerstone of modern microelectronics,can only detect light within a limited wavelength range(<1100 nm)due to its bandgap of 1.12 eV,which restricts its utility in the infrared detection realm.Herein,a photo-driven fin field-effect transistor is presented,which breaks the spectral response constraint of conventional silicon detectors while achieving sensitive infrared detection.This device comprises a fin-shaped silicon channel for charge transport and a lead sulfide film for infrared light harvesting.The lead sulfide film wraps the silicon channel to form a“three-dimensional”infrared-sensitive gate,enabling the photovoltage generated at the lead sulfide-silicon junction to effectively modulate the channel conductance.At room temperature,this device realizes a broadband photodetection from visible(635 nm)to short-wave infrared regions(2700 nm),surpassing the working range of the regular indium gallium arsenide and germanium detectors.Furthermore,it exhibits low equivalent noise powers of 3.2×10^(-12) W·Hz^(-1/2) and 2.3×10^(-11) W·Hz^(-1/2) under 1550 nm and 2700 nm illumination,respectively.These results highlight the significant potential of photo-driven fin field-effect transistors in advancing uncooled silicon-based infrared detection.
基金the Ministry of Science and Technology "973" Plan ( G2000-03-66)"863" Plan (2002AA312060)the Science Foundation of the Central University for Nationalities(CUN07A)
基金This work was supported by the National“973"Project of China(Grant No,G2000-03-66)the National“863”Project(Grant No.2002AA3 12060)of the Ministry of Science and Technology of Chinathe National Natural Science Foundation of China(Grant Nos.69896260 and 60336010).
文摘SOI (silicon-on-insulator) is a new material with a lot of important perform- ances such as large index difference, low transmission loss. Fabrication processes for SOI based optoelectronic devices are compatible with conventional IC processes. Having the potential of OEIC monolithic integration, SOI based optoelectronic devices have shown many good characteristics and become more and more attractive recently. In this paper, the recent progresses of SOI waveguide devices in our research group are presented. By highly effective numerical simulation, the single mode conditions for SOI rib waveguides with rectangular and trapezoidal cross-section were accurately investigated. Using both chemical anisotropic wet etching and plasma dry etching techniques, SOI single mode rib waveguide, MMI coupler, VOA (variable optical attenuator), 2×2 thermal-optical switch were successfully designed and fabricated. Based on these, 4×4 and 8×8 SOI optical waveguide integrated switch matrixes are demonstrated for the first time.
文摘A rearrangeable nonblocking thermo-optic 4×4 switching matrix,which consists of five 2×2 multimode interference-based Mach-Zehnder interferometer(MMI-MZI) switch elements,is designed and fabricated.The minimum and maximum excess loss for the matrix are 6.6 and 10.4dB,respectively.The crosstalk in the matrix is measured to be between -12 and -19.8dB.The switching speed of the matrix is less than 30μs.The power consumption for the single switch element is about 330mW.
