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N-Graphene Nanowalls via Plasma Nitrogen Incorporation and Substitution: The Experimental Evidence 被引量:1
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作者 Neelakandan MSanthosh Gregor Filipič +7 位作者 Eva Kovacevic Andrea Jagodar Johannes Berndt Thomas Strunskus Hiroki Kondo Masaru Hori Elena Tatarova UrošCvelbar 《Nano-Micro Letters》 SCIE EI CAS CSCD 2020年第4期92-108,共17页
Incorporating nitrogen(N)atom in graphene is considered a key technique for tuning its electrical properties.However,this is still a great challenge,and it is unclear how to build N-graphene with desired nitrogen conf... Incorporating nitrogen(N)atom in graphene is considered a key technique for tuning its electrical properties.However,this is still a great challenge,and it is unclear how to build N-graphene with desired nitrogen configurations.There is a lack of experimental evidence to explain the influence and mechanism of structural defects for nitrogen incorporation into graphene compared to the derived DFT theories.Herein,this gap is bridged through a systematic study of different nitrogen-containing gaseous plasma post-treatments on graphene nanowalls(CNWs)to produce N-CNWs with incorporated and substituted nitrogen.The structural and morphological analyses describe a remarkable difference in the plasma–surface interaction,nitrogen concentration and nitrogen incorporation mechanism in CNWs by using different nitrogen-containing plasma.Electrical conductivity measurements revealed that the conductivity of the N-graphene is strongly influenced by the position and concentration of C–N bonding configurations.These findings open up a new pathway for the synthesis of N-graphene using plasma post-treatment to control the concentration and configuration of incorporated nitrogen for application-specific properties. 展开更多
关键词 GRAPHENE Graphene nanowalls Plasma post-treatment nitrogen incorporation Raman spectroscopy Vacancy defects
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Structural and Optical Characterization of Indium Zinc Oxynitride Thin Films
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作者 Jose Juan Ortega Sigala Maria Leticia Perez Arrieta +4 位作者 Hugo TototzintleHuitle Miguel Angel Aguilar Frutis Ciro Falcony Victor Hugo Mendez Garcia Jose de Jesus Araiza Ibarra 《材料科学与工程(中英文A版)》 2014年第3期91-98,共8页
关键词 氧化锌薄膜 氧氮化物 晶体结构 光学特性 SI(100) 椭圆偏振光谱法 薄膜沉积 反应磁控溅射
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氮掺入对N型纳米硅薄膜微观结构及光电特性影响(英文)
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作者 马登浩 张维佳 +4 位作者 罗瑞盈 刘承月 蒋昭毅 马晓波 范志强 《光谱学与光谱分析》 SCIE EI CAS CSCD 北大核心 2017年第2期629-635,共7页
采用等离子体增强化学气相沉积技术(PECVD)通过改变NH_3流量制备出不同含氮量N型富硅氮化硅硅薄膜。利用Raman散射、红外吸收、紫外-可见光分光光度计及暗态I-V测量等技术分析了氮掺入对薄膜微观结构以及光电特性的影响。结果显示,随着N... 采用等离子体增强化学气相沉积技术(PECVD)通过改变NH_3流量制备出不同含氮量N型富硅氮化硅硅薄膜。利用Raman散射、红外吸收、紫外-可见光分光光度计及暗态I-V测量等技术分析了氮掺入对薄膜微观结构以及光电特性的影响。结果显示,随着NH_3的增加,薄膜由微晶硅向纳米硅结构转变,薄膜中晶粒尺寸减少,晶化度降低,微观结构有序性降低,所对应薄膜光学带隙增大,而带尾分布变窄。同时,红外吸收谱分析表明,Si—N键合密度增加,P掺杂受阻。暗态I-V测量显示,薄膜电导率随着NH_3掺入整体较微晶硅降低,但随NH_3增加,电导率受到迁移率和载流子浓度等特征共同作用先降低后变大,揭示了影响薄膜电导率的机制存在一定的竞争,然而过高的非晶网络结构将增大载流子的复合导致薄膜电导率显著降低。 展开更多
关键词 氮掺入 拉曼光谱 傅里叶红外光谱 光吸收谱
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Excessive Cu and Zn affecting on distribution of the metals and activities of glycolytic and nitrogen incorporating key enzymes in mycelia of ectomycorrhizal fungi Suillus bovinus 被引量:9
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作者 HUANG Yi, TAO Shu(Department of Urban and Environmental Sciences, Peking University, Beijing 100871, China. 《Journal of Environmental Sciences》 SCIE EI CAS CSCD 2001年第3期337-341,共5页
Concentration of copper and zinc in isolated Suillus bovinus mycelia, used nutrient solution and 0.5 mol/L EDTA mycelia washing solution were measured to investigate the distribution of heavy metals in mycelia growth ... Concentration of copper and zinc in isolated Suillus bovinus mycelia, used nutrient solution and 0.5 mol/L EDTA mycelia washing solution were measured to investigate the distribution of heavy metals in mycelia growth in excess copper or zinc nutrient solution. Treated with zinc, most of added zinc maintained in used solution, and 9.8%/14.6% was in/on mycelia in treatment, and in treatment 2 was 3.9%/8.0% in/on mycelia. In the copper applications, copper stimulated in more than on mycelia, i.e., 25.9%/4.5% in/on mycelia in treatment, and 7%/18.8% in/on mycelia while most of copper retained in used nutrient solution. Certain amount of copper or zinc uptake by mycelia led to pronounced influence on glycolysis and nitrogen incorporating process of Suillus bovinus, while the tested enzymes kept constant in treatment. In crude extracts of copper treatment 2 mycelia, activities of HK, PFK and GS were inhibited and decrease to 63%, 48% and 38% and GIDH increased by 68% of the control, respectively. The behaviors of these tested enzymes toward zinc corresponded in general with that towards copper. The potential protection of Suillus bovinus for its host plant under excess copper or zinc threaten was discussed. 展开更多
关键词 Suillus bovinus ectomycorrhizal fungous copper zinc GLYCOLYSIS nitrogen incorporate enzymes
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不同湿度条件下N、Si共掺杂DLC膜的摩擦学性能研究 被引量:12
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作者 吴行阳 陈腾 +3 位作者 葛宙 阮敬杰 吕博 张建华 《摩擦学学报》 EI CAS CSCD 北大核心 2017年第4期501-509,共9页
采用射频化学气相法沉积了氮、硅共掺杂类金刚石碳膜(N-Si-DLC).用X射线光电子能谱仪、拉曼光谱仪、表面形貌仪及扫描电子显微镜等对薄膜结构进行了表征,用球-盘往复摩擦试验机考察了不同湿度(RH为15%,45%和75%)空气中薄膜与316L不锈钢... 采用射频化学气相法沉积了氮、硅共掺杂类金刚石碳膜(N-Si-DLC).用X射线光电子能谱仪、拉曼光谱仪、表面形貌仪及扫描电子显微镜等对薄膜结构进行了表征,用球-盘往复摩擦试验机考察了不同湿度(RH为15%,45%和75%)空气中薄膜与316L不锈钢球配副的摩擦学性能.结果表明:与Si-DLC相比,N-Si-DLC膜内sp^2C成分含量较高,N主要以C=N、C≡N、Si-N键形式存在于膜内;膜的内应力低,硬度和杨氏模量较低;含N量少的N-Si-DLC膜显示出更低的摩擦与磨损,其摩擦学性能对湿度的变化表现出较低的敏感性. 展开更多
关键词 类金刚石薄膜 氮掺杂 Si-DLC 湿度 电子受体
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含氮分子筛的研究进展 被引量:6
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作者 武光军 关乃佳 李兰冬 《催化学报》 SCIE EI CAS CSCD 北大核心 2012年第1期51-59,共9页
含氮分子筛作为一种新型的含骨架杂原子分子筛, 具有择形碱催化作用和酸碱双功能催化作用, 近年来引起了人们广泛的研究兴趣. 本文总结了微孔和介孔含氮分子筛在制备、表征和催化性能等方面的研究现状, 重点评述了氮化机理和理论计算在... 含氮分子筛作为一种新型的含骨架杂原子分子筛, 具有择形碱催化作用和酸碱双功能催化作用, 近年来引起了人们广泛的研究兴趣. 本文总结了微孔和介孔含氮分子筛在制备、表征和催化性能等方面的研究现状, 重点评述了氮化机理和理论计算在含氮分子筛研究中的应用, 并展望了含氮分子筛今后的研究方向. 展开更多
关键词 含氮分子筛 表面酸碱性 氮含量 氮化机理 催化性能 理论计算
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磷氮化蓖麻油润滑添加剂的合成及其摩擦学性能 被引量:2
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作者 李昌进 涂政文 徐旺生 《武汉工程大学学报》 CAS 2009年第1期21-24,共4页
在蓖麻油中引入磷和氮,合成了一种磷氮化改性蓖麻油型添加剂,并利用红外光谱对其主要官能团进行了鉴定,利用四球试验机考察其在150SN基础油中的摩擦学性能,用扫描电子显微镜观察分析磨斑表面的形貌.结果表明:磷氮化改性蓖麻油型添加剂... 在蓖麻油中引入磷和氮,合成了一种磷氮化改性蓖麻油型添加剂,并利用红外光谱对其主要官能团进行了鉴定,利用四球试验机考察其在150SN基础油中的摩擦学性能,用扫描电子显微镜观察分析磨斑表面的形貌.结果表明:磷氮化改性蓖麻油型添加剂具有优异的极压、抗磨减摩性能,且在150SN基础油中的最佳添加量为2%,它较150SN基础油能明显减轻钢球表面磨损. 展开更多
关键词 磷氮化改性 摩擦学性能 最佳添加量
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