期刊文献+

N-Graphene Nanowalls via Plasma Nitrogen Incorporation and Substitution: The Experimental Evidence 被引量:1

N-Graphene Nanowalls via Plasma Nitrogen Incorporation and Substitution: The Experimental Evidence
下载PDF
导出
摘要 Incorporating nitrogen(N)atom in graphene is considered a key technique for tuning its electrical properties.However,this is still a great challenge,and it is unclear how to build N-graphene with desired nitrogen configurations.There is a lack of experimental evidence to explain the influence and mechanism of structural defects for nitrogen incorporation into graphene compared to the derived DFT theories.Herein,this gap is bridged through a systematic study of different nitrogen-containing gaseous plasma post-treatments on graphene nanowalls(CNWs)to produce N-CNWs with incorporated and substituted nitrogen.The structural and morphological analyses describe a remarkable difference in the plasma–surface interaction,nitrogen concentration and nitrogen incorporation mechanism in CNWs by using different nitrogen-containing plasma.Electrical conductivity measurements revealed that the conductivity of the N-graphene is strongly influenced by the position and concentration of C–N bonding configurations.These findings open up a new pathway for the synthesis of N-graphene using plasma post-treatment to control the concentration and configuration of incorporated nitrogen for application-specific properties. Incorporating nitrogen(N) atom in graphene is considered a key technique for tuning its electrical properties. However, this is still a great challenge, and it is unclear how to build N-graphene with desired nitrogen configurations. There is a lack of experimental evidence to explain the influence and mechanism of structural defects for nitrogen incorporation into graphene compared to the derived DFT theories. Herein, this gap is bridged through a systematic study of di erent nitrogen-containing gaseous plasma post-treatments on graphene nanowalls(CNWs) to produce N-CNWs with incorporated and substituted nitrogen. The structural and morphological analyses describe a remarkable di erence in the plasma–surface interaction, nitrogen concentration and nitrogen incorporation mechanism in CNWs by using di erent nitrogen-containing plasma. Electrical conductivity measurements revealed that the conductivity of the N-graphene is strongly influenced by the position and concentration of C–N bonding configurations. These findings open up a new pathway for the synthesis of N-graphene using plasma post-treatment to control the concentration and configuration of incorporated nitrogen for application-specific properties.
出处 《Nano-Micro Letters》 SCIE EI CAS CSCD 2020年第4期92-108,共17页 纳微快报(英文版)
基金 funded by the European Union’s Horizon Research and Innovation Program under Grant agreement No. 766894 partially supported also by JSPS, MESS and ARRS under the Japan-Slovenia Research Cooperative Program grants to U.C., M.H. and H.K the allocation of synchrotron radiation beam time at Bessy II via projects 17205612ST/R, 17206156ST, 18106986ST, 19107892-ST/R and 191-08281 ST/R as well as Calypso
关键词 GRAPHENE Graphene nanowalls Plasma post-treatment Nitrogen incorporation Raman spectroscopy Vacancy defects Graphene Graphene nanowalls Plasma post-treatment Nitrogen incorporation Raman spectroscopy Vacancy defects
  • 相关文献

同被引文献5

引证文献1

二级引证文献7

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部