Hydrogen is a ubiquitous element in semiconductor processing and particularly in amorphous and microcrystalline silicon where it plays a crucial role in the growth processes as well as in the material properties. Beca...Hydrogen is a ubiquitous element in semiconductor processing and particularly in amorphous and microcrystalline silicon where it plays a crucial role in the growth processes as well as in the material properties. Because of its low mass it can easily diffuse through the silicon network and leads to the passivation of dangling bonds but it may also play a role in the stabilization of metastable defects. Thus a lot of work has been devoted to the study of hydrogen diffusion, bonding and structure in disordered semiconductors. The sequence, deposition-exposure to H plasma-deposition was used to fabricate the microcrystalline emitter. A proper atomic H pretreatment of c-Si surface before depositions i layer was expected to clean the surface and passivatates the surface states, as a result improing the device parameters. In this study, H2 pretreatment of c-si surface was used at different time, power and temperature. It is found that a proper H pretreatment improves passivation of c-si surface and improves the device parameters by AFM and testing I-V.展开更多
Using SnxTi1-xO2 as carriers, CuO/Sn0.9Zi0.1O2 and CuO/Sn0.7Ti0.3O2 catalysts with different loading amounts of copper oxide （CuO） were prepared by an impregnation method. The catalytic properties of CuO/Sn0.9Ti0.1O...Using SnxTi1-xO2 as carriers, CuO/Sn0.9Zi0.1O2 and CuO/Sn0.7Ti0.3O2 catalysts with different loading amounts of copper oxide （CuO） were prepared by an impregnation method. The catalytic properties of CuO/Sn0.9Ti0.1O2 and CuO/Sn0.7Zi0.3O2 were examined using a microreactor-gas chromatography （GC） NO＋CO reaction system and the methods of BET （Brun- auer-Emmett-Teller）, TG-DTA （themogravimetric and differential thermal analysis）, X-ray diffraction （XRD） and H2-temperature programmed reduction （TPR）. The results showed that NO conversions of Sn0.9Zi0.1O2 and Sn0.7Ti0.3O2 were 47.2% and 43.6% respectively, which increased to 95.3% and 90.9% at 6 wt% CuO loading. However, further increase in CuO loading caused a decrease in the catalytic activity. The nitrogen adsorption-desorption isotherm and pore-size distribution curve of Sn0.9Zi0.1O2 and Sn0.7Ti0.3O2 represented type IV of the BDDT （Brunauer, Deming, Deming and Teller） system and a typical mesoporous sample. There were two CuO diffraction peaks （2θ 35.5° and 38.7°）, and the diffraction peak areas increased with increasing CuO loading. TPR analysis also detected three peaks （α, β and γ） from the CuO-loaded catalysts, suggesting that the α peak was the reduction of the highly dispersed copper oxide, the β peak was the reduction of the isolated copper oxide, and the y peak was the reduction of crystal phase copper oxide. In addition, a fourth peak （5） of the catalysts meant that the SnxTi1-xO2 mixed oxides could be reductive.展开更多
[ Objective] The aim was to study pretreatment of ultrasound enhancing dilute H2SO4 on cellulase activity of corn straw liquid fermentation and explore the pretretment＇ s optimal conditions. [ Method ] By using ortho...[ Objective] The aim was to study pretreatment of ultrasound enhancing dilute H2SO4 on cellulase activity of corn straw liquid fermentation and explore the pretretment＇ s optimal conditions. [ Method ] By using orthogonal test, the pretretment of ultrasound enhancing dilute H2SO4 on corn straw was studied, then straw was fermented as the sole carbon source. Finally, the cellulase activity in extracellular fermentation broth was determined. [Result] The results showed that cellulase activity in extracellular broth was greatest under the conditions of acid bath time 3 h, acid concentration 3.5%, ultrasonic power 150 W, and ultrasonic time 5 h. They were FPA 15.82 U/ml, Cx 39.9 U/ml, 13-Giu 55.94 U/ml respectively. [ Conclusion] Under the above conditions, extracellular cellulase production has a high stability.展开更多
A microwave-H202 process for sludge pretreatment exhibited high efticiencies of releasing organics, nitrogen, and phosphorus, but large quantifies of H202 residues were detected. A uniform design method was thus emplo...A microwave-H202 process for sludge pretreatment exhibited high efticiencies of releasing organics, nitrogen, and phosphorus, but large quantifies of H202 residues were detected. A uniform design method was thus employed in this study to further optimize H202 dosage by investigating effects of pH and H202 dosage on the amount of 1-I202 residue and releases of organics, nitrogen, and phosphorus. A regression model was established with pH and H202 dosage as the independent variables, and H202 residue and releases of organics, nitrogen, and phosphorus as the dependent variables. In the optimized microwave-H202 process, the pH value of the sludge was firstly adjusted to 11.0, then the sludge was heated to 80~C and H202 was dosed at a H202 ：mixed liquor suspended solids （MLSS） ratio of 0.2, and the sludge was finally heated to 100~C by microwave irradiation. Compared to the microwave-H202 process without optimization, the H202 dosage and the utilization rate of H202 in the optimized microwave-H202 process were reduced by 80% and greatly improved by 3.87 times, respectively, when the H202：MLSS dosage ratio was decreased from 1.0 to 0.2, resulting in nearly the same release rate of soluble chemical oxygen demand in the microwave-H202 process without optimization at H202：MLSS ratio of 0.5.展开更多
基金This project was financially supported by the Natural Science Foundation of Hebei Province, China (No.F2005000073).
文摘Hydrogen is a ubiquitous element in semiconductor processing and particularly in amorphous and microcrystalline silicon where it plays a crucial role in the growth processes as well as in the material properties. Because of its low mass it can easily diffuse through the silicon network and leads to the passivation of dangling bonds but it may also play a role in the stabilization of metastable defects. Thus a lot of work has been devoted to the study of hydrogen diffusion, bonding and structure in disordered semiconductors. The sequence, deposition-exposure to H plasma-deposition was used to fabricate the microcrystalline emitter. A proper atomic H pretreatment of c-Si surface before depositions i layer was expected to clean the surface and passivatates the surface states, as a result improing the device parameters. In this study, H2 pretreatment of c-si surface was used at different time, power and temperature. It is found that a proper H pretreatment improves passivation of c-si surface and improves the device parameters by AFM and testing I-V.
基金Project (No. Y504131) supported by the Natural Science Foundation of Zhejiang Province, China
文摘Using SnxTi1-xO2 as carriers, CuO/Sn0.9Zi0.1O2 and CuO/Sn0.7Ti0.3O2 catalysts with different loading amounts of copper oxide （CuO） were prepared by an impregnation method. The catalytic properties of CuO/Sn0.9Ti0.1O2 and CuO/Sn0.7Zi0.3O2 were examined using a microreactor-gas chromatography （GC） NO＋CO reaction system and the methods of BET （Brun- auer-Emmett-Teller）, TG-DTA （themogravimetric and differential thermal analysis）, X-ray diffraction （XRD） and H2-temperature programmed reduction （TPR）. The results showed that NO conversions of Sn0.9Zi0.1O2 and Sn0.7Ti0.3O2 were 47.2% and 43.6% respectively, which increased to 95.3% and 90.9% at 6 wt% CuO loading. However, further increase in CuO loading caused a decrease in the catalytic activity. The nitrogen adsorption-desorption isotherm and pore-size distribution curve of Sn0.9Zi0.1O2 and Sn0.7Ti0.3O2 represented type IV of the BDDT （Brunauer, Deming, Deming and Teller） system and a typical mesoporous sample. There were two CuO diffraction peaks （2θ 35.5° and 38.7°）, and the diffraction peak areas increased with increasing CuO loading. TPR analysis also detected three peaks （α, β and γ） from the CuO-loaded catalysts, suggesting that the α peak was the reduction of the highly dispersed copper oxide, the β peak was the reduction of the isolated copper oxide, and the y peak was the reduction of crystal phase copper oxide. In addition, a fourth peak （5） of the catalysts meant that the SnxTi1-xO2 mixed oxides could be reductive.
基金Supported by the National Key Technology R&D Program during the11~(th)five-year Plan(2007BAD34B03)the Important Project of Ministryof Education(107127)Scientific Research Foundation ofHefei University of Technology(113-036404)~~
文摘[ Objective] The aim was to study pretreatment of ultrasound enhancing dilute H2SO4 on cellulase activity of corn straw liquid fermentation and explore the pretretment＇ s optimal conditions. [ Method ] By using orthogonal test, the pretretment of ultrasound enhancing dilute H2SO4 on corn straw was studied, then straw was fermented as the sole carbon source. Finally, the cellulase activity in extracellular fermentation broth was determined. [Result] The results showed that cellulase activity in extracellular broth was greatest under the conditions of acid bath time 3 h, acid concentration 3.5%, ultrasonic power 150 W, and ultrasonic time 5 h. They were FPA 15.82 U/ml, Cx 39.9 U/ml, 13-Giu 55.94 U/ml respectively. [ Conclusion] Under the above conditions, extracellular cellulase production has a high stability.
基金supported by the National Natural Science Foundation of China (No. 51008297)the Hi-Tech Research and Development Program (863) of China(No. 2007AA06Z347)the National Major Science & Technology Projects for Water Pollution Control and Management (No. 2012ZX07202-005)
文摘A microwave-H202 process for sludge pretreatment exhibited high efticiencies of releasing organics, nitrogen, and phosphorus, but large quantifies of H202 residues were detected. A uniform design method was thus employed in this study to further optimize H202 dosage by investigating effects of pH and H202 dosage on the amount of 1-I202 residue and releases of organics, nitrogen, and phosphorus. A regression model was established with pH and H202 dosage as the independent variables, and H202 residue and releases of organics, nitrogen, and phosphorus as the dependent variables. In the optimized microwave-H202 process, the pH value of the sludge was firstly adjusted to 11.0, then the sludge was heated to 80~C and H202 was dosed at a H202 ：mixed liquor suspended solids （MLSS） ratio of 0.2, and the sludge was finally heated to 100~C by microwave irradiation. Compared to the microwave-H202 process without optimization, the H202 dosage and the utilization rate of H202 in the optimized microwave-H202 process were reduced by 80% and greatly improved by 3.87 times, respectively, when the H202：MLSS dosage ratio was decreased from 1.0 to 0.2, resulting in nearly the same release rate of soluble chemical oxygen demand in the microwave-H202 process without optimization at H202：MLSS ratio of 0.5.
