Diamond-coated tools were fabricated using Co-cemented carbide inserts as substrates by the electronically aided hot filament chemical vapor deposition (EACVD). An amount of additive in an acid solution was used to pr...Diamond-coated tools were fabricated using Co-cemented carbide inserts as substrates by the electronically aided hot filament chemical vapor deposition (EACVD). An amount of additive in an acid solution was used to promote the Co etching of the substrate surface. The surface of the WC-Co substrate was decarburized by microwave plasma with Ar-H 2 gas. Effect of the new substrate pretreatment on the adhesion of diamond films was investigated. A boron-doped solution was brushed on the tool surface to diffuse boron into the substrates during diamond deposition. A new process was used to lower the surface roughness of diamond thin films by appropriately controlling deposition parameters. It consists of a composite diamond film chemical vapor deposition procedure including first the deposition of the rough polycrystalline diamond and then the fine-grained diamond. The research results show that the pretreatment including both Co etching in acid solution and Ar-H 2 etching decarburization by microwave plasma is an effective method to enhance adhesive strength. An adequate amount of boron dopant solution can effectively suppress the cobalt diffusion to the surface and avoid the catalytic effect of Co at the high temperature. The composite film CVD process can deposit smooth diamond films with low surface roughness. It is of great significance for improvement of the cutting performances of diamond-coated tools using the above new technology to deposit diamond coatings with the low surface roughness and high adhesive strength on WC-Co substrates.展开更多
以H2和CH4的混合气体为气源,用微波等离子体辅助化学气相沉积法(MPECVD)在1 cm×1 cm S i(100)基体上沉积了金刚石薄膜。研究了不同的甲烷浓度对金刚石薄膜(100)织构生长趋势的影响。分别采用扫描电子显微镜(SEM),Ram an光谱对金刚...以H2和CH4的混合气体为气源,用微波等离子体辅助化学气相沉积法(MPECVD)在1 cm×1 cm S i(100)基体上沉积了金刚石薄膜。研究了不同的甲烷浓度对金刚石薄膜(100)织构生长趋势的影响。分别采用扫描电子显微镜(SEM),Ram an光谱对金刚石膜的表面形貌、质量进行了分析。结果表明,当基体温度为750℃,气压为4.8×103Pa,甲烷浓度为1.4%时,薄膜表面为(100)织构。展开更多
Ⅰ. INTRODUCTIONThe preparation and application studies of diamond thin films as a new type of multifunction materials have made a great progress in recent years. Up to now, the initial applications of diamond thin fi...Ⅰ. INTRODUCTIONThe preparation and application studies of diamond thin films as a new type of multifunction materials have made a great progress in recent years. Up to now, the initial applications of diamond thin films prepared by various methods based on chemical vapor deposi-展开更多
文摘Diamond-coated tools were fabricated using Co-cemented carbide inserts as substrates by the electronically aided hot filament chemical vapor deposition (EACVD). An amount of additive in an acid solution was used to promote the Co etching of the substrate surface. The surface of the WC-Co substrate was decarburized by microwave plasma with Ar-H 2 gas. Effect of the new substrate pretreatment on the adhesion of diamond films was investigated. A boron-doped solution was brushed on the tool surface to diffuse boron into the substrates during diamond deposition. A new process was used to lower the surface roughness of diamond thin films by appropriately controlling deposition parameters. It consists of a composite diamond film chemical vapor deposition procedure including first the deposition of the rough polycrystalline diamond and then the fine-grained diamond. The research results show that the pretreatment including both Co etching in acid solution and Ar-H 2 etching decarburization by microwave plasma is an effective method to enhance adhesive strength. An adequate amount of boron dopant solution can effectively suppress the cobalt diffusion to the surface and avoid the catalytic effect of Co at the high temperature. The composite film CVD process can deposit smooth diamond films with low surface roughness. It is of great significance for improvement of the cutting performances of diamond-coated tools using the above new technology to deposit diamond coatings with the low surface roughness and high adhesive strength on WC-Co substrates.
文摘以H2和CH4的混合气体为气源,用微波等离子体辅助化学气相沉积法(MPECVD)在1 cm×1 cm S i(100)基体上沉积了金刚石薄膜。研究了不同的甲烷浓度对金刚石薄膜(100)织构生长趋势的影响。分别采用扫描电子显微镜(SEM),Ram an光谱对金刚石膜的表面形貌、质量进行了分析。结果表明,当基体温度为750℃,气压为4.8×103Pa,甲烷浓度为1.4%时,薄膜表面为(100)织构。
文摘Ⅰ. INTRODUCTIONThe preparation and application studies of diamond thin films as a new type of multifunction materials have made a great progress in recent years. Up to now, the initial applications of diamond thin films prepared by various methods based on chemical vapor deposi-
