A new net-shape cathode sputtering target which has a simple structure and a hig h sputtering was put forward. The multiple-structure made of alloying and coatin g layers of tantalum was achieved on the surface of TC4...A new net-shape cathode sputtering target which has a simple structure and a hig h sputtering was put forward. The multiple-structure made of alloying and coatin g layers of tantalum was achieved on the surface of TC4 (Ti6Al4V) using this met hod in double glow surface alloying process. The tantalized samples were investi gated by SEM, XRD and electrochemical corrosion method .Results show the complic ated tissue of pure tantalizing layer and diffusion layer was successfully forme d on the surface of TC4 with the method of net-shape cathode glow discharge, whi ch further improved the corrosion-resistance of TC4 and formed good corrosion-re sistant alloys.展开更多
For the purpose of producing high intensity, multiply charged metal ion beams, the dual hollow cathode ion source for metal ions （DUHOCAMIS） was derived from the hot cathode Penning ion source combined with the holl...For the purpose of producing high intensity, multiply charged metal ion beams, the dual hollow cathode ion source for metal ions （DUHOCAMIS） was derived from the hot cathode Penning ion source combined with the hollow cathode sputtering experiments in 2007. To investigate the behavior of this discharge geometry in a stronger magnetic bottle-shaped field, a new test bench for DUHOCAMIS with a high magnetic bottle-shaped field up to 0.6 T has been set up at the Peking University. The experiments with magnetic fields from 0.13 T to 0.52 T have indicated that the discharge behavior is very sensitive to the magnetic flux densities. The slope of discharge curves in a very wide range can be controlled by changing the magnetic field as well as regulated by adjusting the cathode heating power; the production of metallic ions would be much greater than gas ions with the increased magnetic flux density; and the magnetic field has a much higher influence on the DHCD mode than on the PIG mode.展开更多
文摘A new net-shape cathode sputtering target which has a simple structure and a hig h sputtering was put forward. The multiple-structure made of alloying and coatin g layers of tantalum was achieved on the surface of TC4 (Ti6Al4V) using this met hod in double glow surface alloying process. The tantalized samples were investi gated by SEM, XRD and electrochemical corrosion method .Results show the complic ated tissue of pure tantalizing layer and diffusion layer was successfully forme d on the surface of TC4 with the method of net-shape cathode glow discharge, whi ch further improved the corrosion-resistance of TC4 and formed good corrosion-re sistant alloys.
基金Supported by National Natural Science Foundation of China(11105008,10775011)
文摘For the purpose of producing high intensity, multiply charged metal ion beams, the dual hollow cathode ion source for metal ions （DUHOCAMIS） was derived from the hot cathode Penning ion source combined with the hollow cathode sputtering experiments in 2007. To investigate the behavior of this discharge geometry in a stronger magnetic bottle-shaped field, a new test bench for DUHOCAMIS with a high magnetic bottle-shaped field up to 0.6 T has been set up at the Peking University. The experiments with magnetic fields from 0.13 T to 0.52 T have indicated that the discharge behavior is very sensitive to the magnetic flux densities. The slope of discharge curves in a very wide range can be controlled by changing the magnetic field as well as regulated by adjusting the cathode heating power; the production of metallic ions would be much greater than gas ions with the increased magnetic flux density; and the magnetic field has a much higher influence on the DHCD mode than on the PIG mode.
