Ti（C, N） multilayer films have been prepared by closed-field unbalanced magnetron sputtering technology and using graphite target as the C supplier. Microstructural observation results showed that the Ti（C, N） fil...Ti（C, N） multilayer films have been prepared by closed-field unbalanced magnetron sputtering technology and using graphite target as the C supplier. Microstructural observation results showed that the Ti（C, N） films exhibited multilayer structure with most of fine nano-columnar Ti（C, N） grains existing in the films. The current of graphite target had an effect remarkably on the multilayer structure of films： the periodical thickness gradually increased as the current went up, but the grain size of films gradually decreased and even amorphous phase appeared as the current further increased. The microstructure of Ti（C, N） films changed from columnar crystallite to nanocomposite in high current of graphite target where the fine Ti（C, N） grains were distributed uniformly in the amorphous Ti（C, N） matrix, and the volume fraction of the amorphous phase increased with increasing current. Measurement results showed that the Ti（C, N） multilayer films have high rnicrohardness and low friction coefficient, and especially the film deposited in the current of 0.9 A exhibits superior properties with optimizing hardness and friction coefficient. Based on the relationship of the microstructure and the properties of films, the multilayer structure and fine grain size of Ti（C, N） films are responsible for their well mechanical and friction properties. And choosing the graphite target as the C supplier is more propitious to decrease the friction coefficients of films.展开更多
Ti-doped graphite-like carbon （Ti-GLC） films were synthesized successfully by magnetron sputtering technique. The compositions, microstructures and properties of the Ti-doped GLC films dependent on the parameter of ...Ti-doped graphite-like carbon （Ti-GLC） films were synthesized successfully by magnetron sputtering technique. The compositions, microstructures and properties of the Ti-doped GLC films dependent on the parameter of Ti target current were systemically investigated by Raman spectra, X-ray photoelectron spectroscopy （XPS）, X-ray diffraction （XRD）, scanning electron microscopy （SEM）, atomic force microscopy （AFM）, nanoindentation and ball-on-disk tribometer. With the increase of the Ti target current, the ratio of sp2 bond and the content of Ti as well as the film hardness and compressive internal stress increase, but the high content of the Ti would result in the loose film due to the formation of the squamose structure. Less incorporated Ti reduces the friction of the GLC film in dry-sliding condition, while pure GLC film exhibits the lowest friction coefficient in water-lubricated condition. Ti-GLC film deposited with low Ti target current shows high wear resistance in both dry-sliding and water-lubricated conditions.展开更多
采用多弧离子镀在高速钢基底上沉积Ti Al N薄膜。利用扫描电镜(SEM)观测薄膜的表面形貌;用EDS分析薄膜表面的成分;用表面轮廓仪测试薄膜的厚度并结合沉积时间计算出沉积速率;用维氏硬度仪测量薄膜的硬度;用XRD表征薄膜的微观结构。结果...采用多弧离子镀在高速钢基底上沉积Ti Al N薄膜。利用扫描电镜(SEM)观测薄膜的表面形貌;用EDS分析薄膜表面的成分;用表面轮廓仪测试薄膜的厚度并结合沉积时间计算出沉积速率;用维氏硬度仪测量薄膜的硬度;用XRD表征薄膜的微观结构。结果表明,随着偏压峰值的增大,表面大颗粒逐渐减少,致密性逐渐变好,薄膜硬度也随之增加。沉积参数对薄膜成分有影响,偏压峰值对薄膜中Al含量有较明显的影响,而占空比则主要影响Ti含量。本文对实验结果进行了较详细的讨论和分析。展开更多
In order to investigate nanomechanical properties of nanostructured Ti metallic material, pure Ti films were prepared by magnetron sputtering at the bias voltage of 0-140 V. The microstructure of Ti films was characte...In order to investigate nanomechanical properties of nanostructured Ti metallic material, pure Ti films were prepared by magnetron sputtering at the bias voltage of 0-140 V. The microstructure of Ti films was characterized by X-ray diffraction（XRD）, scanning electron microscopy（SEM） and high-resolution transmission electron microscopy（HRTEM）. It is interesting to find that the microstructure of pure Ti films was characterized by the composite structure of amorphous-like matrix embodied with nanocrystallines, and the crystallization was improved with the increase of bias voltage. The hardness of Ti films measured by nanoindentation tests shows a linear relationship with grain sizes in the scale of 6-15 nm. However, the pure Ti films exhibit a soft tendency characterized by a smaller slope of Hall-Petch relationship. In addition, the effect of bias voltage on the growth orientation of Ti films was discussed.展开更多
基金supported by the National Natural Science Foundation of China (No. 50971097)Shaanxi Provincial Project of Special Foundation of Key Disciplines
文摘Ti（C, N） multilayer films have been prepared by closed-field unbalanced magnetron sputtering technology and using graphite target as the C supplier. Microstructural observation results showed that the Ti（C, N） films exhibited multilayer structure with most of fine nano-columnar Ti（C, N） grains existing in the films. The current of graphite target had an effect remarkably on the multilayer structure of films： the periodical thickness gradually increased as the current went up, but the grain size of films gradually decreased and even amorphous phase appeared as the current further increased. The microstructure of Ti（C, N） films changed from columnar crystallite to nanocomposite in high current of graphite target where the fine Ti（C, N） grains were distributed uniformly in the amorphous Ti（C, N） matrix, and the volume fraction of the amorphous phase increased with increasing current. Measurement results showed that the Ti（C, N） multilayer films have high rnicrohardness and low friction coefficient, and especially the film deposited in the current of 0.9 A exhibits superior properties with optimizing hardness and friction coefficient. Based on the relationship of the microstructure and the properties of films, the multilayer structure and fine grain size of Ti（C, N） films are responsible for their well mechanical and friction properties. And choosing the graphite target as the C supplier is more propitious to decrease the friction coefficients of films.
基金Project (50905178) supported by the National Natural Science Foundation of ChinaProject (2011CB706603) supported by the National Basic Research Program of China
文摘Ti-doped graphite-like carbon （Ti-GLC） films were synthesized successfully by magnetron sputtering technique. The compositions, microstructures and properties of the Ti-doped GLC films dependent on the parameter of Ti target current were systemically investigated by Raman spectra, X-ray photoelectron spectroscopy （XPS）, X-ray diffraction （XRD）, scanning electron microscopy （SEM）, atomic force microscopy （AFM）, nanoindentation and ball-on-disk tribometer. With the increase of the Ti target current, the ratio of sp2 bond and the content of Ti as well as the film hardness and compressive internal stress increase, but the high content of the Ti would result in the loose film due to the formation of the squamose structure. Less incorporated Ti reduces the friction of the GLC film in dry-sliding condition, while pure GLC film exhibits the lowest friction coefficient in water-lubricated condition. Ti-GLC film deposited with low Ti target current shows high wear resistance in both dry-sliding and water-lubricated conditions.
文摘采用多弧离子镀在高速钢基底上沉积Ti Al N薄膜。利用扫描电镜(SEM)观测薄膜的表面形貌;用EDS分析薄膜表面的成分;用表面轮廓仪测试薄膜的厚度并结合沉积时间计算出沉积速率;用维氏硬度仪测量薄膜的硬度;用XRD表征薄膜的微观结构。结果表明,随着偏压峰值的增大,表面大颗粒逐渐减少,致密性逐渐变好,薄膜硬度也随之增加。沉积参数对薄膜成分有影响,偏压峰值对薄膜中Al含量有较明显的影响,而占空比则主要影响Ti含量。本文对实验结果进行了较详细的讨论和分析。
基金Projects(51102264,51271123)supported by the National Natural Science Foundation of ChinaProjects(5313310202,13ZR1427900)supported by Shanghai Municipal Education Commission,China
文摘In order to investigate nanomechanical properties of nanostructured Ti metallic material, pure Ti films were prepared by magnetron sputtering at the bias voltage of 0-140 V. The microstructure of Ti films was characterized by X-ray diffraction（XRD）, scanning electron microscopy（SEM） and high-resolution transmission electron microscopy（HRTEM）. It is interesting to find that the microstructure of pure Ti films was characterized by the composite structure of amorphous-like matrix embodied with nanocrystallines, and the crystallization was improved with the increase of bias voltage. The hardness of Ti films measured by nanoindentation tests shows a linear relationship with grain sizes in the scale of 6-15 nm. However, the pure Ti films exhibit a soft tendency characterized by a smaller slope of Hall-Petch relationship. In addition, the effect of bias voltage on the growth orientation of Ti films was discussed.
