摘要
通过中频脉冲磁控溅射的方法,在玻璃基底上沉积得到了表面均匀性好、致密度高的钛薄膜。在NH4F/乙二醇+H2O电解液体系中对该钛膜进行电化学阳极氧化。结果表明:30V恒电压下,当NH4F浓度从0.5%(质量分数,下同)增加到1%时,阳极氧化后形成的TiO2膜层逐渐从纳米孔结构转变成纳米管结构;当NH4F浓度低于0.75%时,随阳极氧化电压的增加,形成的TiO2膜层不会出现从纳米孔到纳米管结构的转变。
Dense Ti films with uniform surface were deposited on glass pieces by using medium frequency pulsed magnetron sputtering method.The Ti films were subsequently anodized in NH4 F/ethylene glycerol＋H2 O electrolytes.The results show that under a constant anodization voltage of 30V,increasing the concentration of NH4F from 0.5％ （mass fraction） to 1％ makes the formed TiO2 layers gradually change from a nanoporous to a nanotubular structure.And at a low concentration of NH4F （less than 0.75％）,the same change is not observed with increasing the anodization voltage.
出处
《材料工程》
EI
CAS
CSCD
北大核心
2014年第1期58-63,74,共7页
Journal of Materials Engineering
