摘要
In order to clarify the visible-light responsive photocatalysis of TiO2 co-doped with Cu and N atoms, plasma-nitridation was taken place to Cu-doped TiO2 film. Cu-doped TiO2 films were prepared by dip-coating method and they were nitrided by nitrogen plasma in the plasma-enhanced CVD system. Cu-doped TiO2 films before and after plasma-nitridation show similar X-ray diffraction peaks of anatase TiO2. XPS analysis reveals that the ionic states of Ti and Cu in the Cu-doped TiO2 films are Ti4+ and Cu+, respectively. After nitrogen plasma treatment, oxygen atoms are released by substitution of nitrogen atoms in the TiO2 matrix, so that Cu+ is oxidized to generate Cu2+ and at the same time oxygen vacancy is formed. The absorption edge of both Cu-doped and plasma-nitrided Cu-doped TiO2 did red shift. Visible-light responsive photocatalytic activity of the Cu-doped TiO2 film degraded after nitrogen plasma treatment.
In order to clarify the visible-light responsive photocatalysis of TiO2 co-doped with Cu and N atoms, plasma-nitridation was taken place to Cu-doped TiO2 film. Cu-doped TiO2 films were prepared by dip-coating method and they were nitrided by nitrogen plasma in the plasma-enhanced CVD system. Cu-doped TiO2 films before and after plasma-nitridation show similar X-ray diffraction peaks of anatase TiO2. XPS analysis reveals that the ionic states of Ti and Cu in the Cu-doped TiO2 films are Ti4+ and Cu+, respectively. After nitrogen plasma treatment, oxygen atoms are released by substitution of nitrogen atoms in the TiO2 matrix, so that Cu+ is oxidized to generate Cu2+ and at the same time oxygen vacancy is formed. The absorption edge of both Cu-doped and plasma-nitrided Cu-doped TiO2 did red shift. Visible-light responsive photocatalytic activity of the Cu-doped TiO2 film degraded after nitrogen plasma treatment.
