摘要
采用电化学沉积方法,以甲醇溶剂作碳源,直流电压作用下在单晶硅表面沉积得到碳薄膜。通过研究石墨、金刚石和样品薄膜的XPS和XAES谱图特征,证明了此方法沉积得到的是DLC薄膜;利用曲线拟合技术在C1s电子能谱图中拟合出sp3峰与sp2峰,并计算出样品薄膜中sp3碳的相对含量为55%;研究石墨、金刚石和样品薄膜的一阶微分XAES谱图,用线性插入法估算出样品薄膜中sp3碳的相对含量为60%。
The carbon film was deposited on silicon substrates by the electrolysis of methanol. XPS and XAES spectra show that the sample film is a diamond-like carbon (DLC) film. A curve-fitting technique was applied to separate C-1s peak in the XPS spectra of the sample film into sp(3) peak and sp(2) peak, for which the percentage of sp(3) is 55%. The first-derivative XAES spectra also show that the percentage of sp(3) is approximate to 60% by the means of linear interpolation of D.
出处
《无机化学学报》
SCIE
CAS
CSCD
北大核心
2003年第6期569-573,共5页
Chinese Journal of Inorganic Chemistry
基金
国家自然科学基金资助项目(No.50172052
50175105)
中科院百人计划资助项目。
