摘要
研究了利用液态源雾化化学沉积 (LSMCD)法制备纳米 (Pb ,La)TiO3 薄膜的工艺。XRD和SEM分析表明 :沉积 4次 ,采用RCA热处理 ,在Pt/Ti/SiO2 /Si基板上成功制备出具有钙钛矿结构的、晶粒粒径约 6 0nm、厚度约 180nm的纳米颗粒PLT薄膜。该方法既可以较精确的控制薄膜的化学计量比及掺杂浓度 ,又可采用控制超声雾化沉积的时间和次数来有效的控制膜厚及晶粒的大小。该工艺的沉积速率约为 3nm/min。
In this paper,the preparation of nano-particle PLT thin films by liquid source misted chemical deposition(LSMCD)was presented X-ray diffraction(XRD)and scanning electron microscopy(SEM)showed that the nano-particle PLT thin films with perovskite phase were prepared on Pt/Ti/SiO 2/Si substrates by rapid thermal and conventional furnace annealing(RCA)after depositing 4 times,whose diameter of crystal particle and thickness were about 60nm and 180nm,respectively The proportion of chemical elements and the concentration of dopant could be controlled exactly by this method,and the thickness of thin films and the diameter of crystal particle were controlled by the duration and times of super sonic misted deposition The deposition speed was about 3nm/min
出处
《硅酸盐通报》
CAS
CSCD
2003年第6期88-91,共4页
Bulletin of the Chinese Ceramic Society
