摘要
氮化硅(Si_3N_4)是优良的陶瓷材料,应用十分广泛。本文论述了激光诱导化学气相沉积法制备纳米Si_3N_4的工作原理,提出了减少游离硅的措施,采用双光束激发制备得到了超微的、非晶纳米 Si_3N_4粉体。
The Si3N4 is a kind of excellent ceramic material. It is used in many areas. In this article, the general principles of LICVD (Laser Induced Chemical Vapour Deposition) are investigated and measures to reduce dissociated Si are put forward. By applying double beam optical stimulation, we can obtain ultrafine and amorphous Si3N4 nano-powder.
出处
《光电子技术与信息》
2003年第3期25-27,共3页
Optoelectronic Technology & Information
