摘要
用朗缪尔单探针技术对离子渗金属中的等离子体参数进行了诊断,讨论工艺参数对等离子体参数的影响。结果表明,随着工件阴极电压、源极电压和气压的增加,等离子体密度增大。利用等离子体参数结合放电特征对工艺参数进行了优化限定。讨论了等离子体参数对渗层成分的影响。
Langmuir probe technique was used for the plasma diagnostics of doubleglow plasma surface alloying process. Effects of the process parameters on plasma parameters were discussed. It is shown that the plasma density increases with increasing workpiece voltage, source voltage and gas pressure. The process parameters are optimized and limited by considering the plasma parameters with discharge characteristics. The effect of plasma parameters on the surface composition of the alloyed layer was also discussed.
出处
《中国有色金属学报》
EI
CAS
CSCD
北大核心
2003年第2期311-314,共4页
The Chinese Journal of Nonferrous Metals
基金
山西省自然科学基金资助项目(991053)
