摘要
本文配合阶段性薄膜制备工艺,用有限厚度范围内的转换因子法及模拟薄膜标样的基本参数法,X-射线荧光光谱非破坏测定钇、钡、铜超导薄膜。经我们实验,它们与破坏法ICP相比,A_((Ba/Y))克原子比的平均绝对偏差分别为0.15与0.065,A_((Cu/Y))克原子比的平均绝对偏差分别为0.14与0.088,模拟薄膜标样的基本参数法优于转换因子法。作者还对薄膜试样非破坏测定中的标样选用进行了探讨。
The conversion factor method within limited thickness range and the fundamental parameter method with simulation thin film standard have been used in nondestructive analysis components of yttrium, barium and copper in supperconductive thin films by the PW1404 X-ray fluorescence spectrometer. It will satisfy the thin film processing. The maximum deviation is within 2% compared with Inductive Couple Plasma Spectrometry. The experimental results show that the standard specimens kind will affect the accuracy of nondestructive analysis. In general, the multiple elements thin film standard specimen will be better than others.
出处
《光谱学与光谱分析》
SCIE
EI
CAS
CSCD
北大核心
1992年第4期89-92,共4页
Spectroscopy and Spectral Analysis
关键词
非破坏分析
超导
薄膜
X射线荧光
Nondestructive Supperconductive thin films X-ray fluorescent spectrometry
