摘要
提出用表面去除廓形来描述模具表面在垂直于抛光轨迹方向的抛光去除量。在假设抛光工具与模具自由曲面的接触服从椭圆赫兹接触的前提下,利用提出的抛光去除系数推导了表面去除廓形的理论方程。仿真和试验结果揭示了抛光表面去除的规律,验证了表面去除廓形的理论模型。
Material removal profile is proposed to describe the depth of material removal orthogonal to the tool path on a mold surface. Assuming that the contact between the tool and the mold free-form surface is the elliptical Hertzian contact, the theoretical equation of the material removal profile is derived based on the presented material removal coefficient. The experimental results agree well with the simulation predictions, which reveals the regularities of material removal and verifies the theoretical model of the material removal profile.
出处
《机械工程学报》
EI
CAS
CSCD
北大核心
2002年第12期98-102,共5页
Journal of Mechanical Engineering
基金
国家自然科学基金资助项目(59875026)。
