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感光材料的制备及微纳加工综合实验设计

Comprehensive experiment design of photosensitive materials preparation and the micro-nano fabrication
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摘要 在新时代“新工科”教育背景下,贴近科技发展前沿,培养家国情怀,提高学生的专业实验水平和科技创新能力意义重大。从当前“卡脖子”的热点问题出发,开展与芯片加工相关的光刻实验。通过使用商用光刻胶,要求学生掌握光刻的理论知识和基本流程;在此基础上,利用感光溶胶-凝胶法自制一种感光材料,并与商用光刻胶进行对比,让学生深入了解光刻胶的特性及其国外垄断和断供现状。通过本实验的学习,可以加深学生对专业知识的认知,同时激发学习热情,这对于培养具有国际视野、家国情怀的高层次、应用型人才十分重要。 Under the background of“Emerging Engineering”education in the new era,it is of great significance to aim at the frontier of scientific and technological development,cultivate students’feelings of family and country and improve their professional experiment level and innovation ability.In this paper,fucus on the“strangle hold”technology,photolithography experiments related to chip processing have been carried out.By using commercial photoresist,students are required to master the theoretical knowledge and basic process of photolithography.Then,a photosensitive material was prepared by photosensitive sol-gel and compared with the commercial photoresist.There studies can help students to further learn the characteristics of photoresist and know well the monopoly and supply disruption crisis of this materials.Through the study of this experiment,students can deepen their understanding of professional knowledge and stimulate their enthusiasm for learning.It is very important for cultivating high-level and applied talents with international vision and national feelings.
作者 王哲哲 贾思仪 杨晨 冯卓宏 王丽丽 陈水源 WANG Zhezhe;JIA Siyi;YANG Chen;FENG Zhuohong;WANG Lili;CHEN Shuiyuan(College of Physics and Energy,Fujian Normal University,Fuzhou 350117,China;National Demonstration Center for Experimental Physics Education(Fujian Normal University),Fujian Normal University,Fuzhou 350117,China)
出处 《实验室科学》 2024年第5期41-45,共5页 Laboratory Science
基金 福建省教育教学研究重大项目(项目编号:FBJY20230287) 2021年高等学校大学物理课程教学指导委员会华东地区工作委员会教学研究项目(项目编号:2021JZWHD04) 福建师范大学碳中和研究院开放基金(项目编号:TZH2022-08) 2021年福建师范大学课程思政示范课程建设项目(项目编号:K202101041)。
关键词 新工科 综合实验设计 光刻 感光溶胶-凝胶 emerging engineering comprehensive experimental design photolithography photosensitive sol-gel
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