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Advanced carbon nitride-based single-atomphotocatalysts

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摘要 Single-atom catalysts(SACs)have rapidly become a hot topic in photocatalytic research due to their unique physical and chemical properties,high activity,and high selectivity.Among many semiconductor carriers,the special structure of carbon nitride(C3N4)perfectly meets the substrate requirements for stabi-lizing SACs;they can also compensate for the photocatalytic defects of C3N4 materials by modifying energy bands and electronic structures.Therefore,devel-oping advanced C3N4-based SACs is of great significance.In this review,we focus on elucidating efficient preparation strategies and the burgeoning photo-catalytic applications of C3N4-based SACs.We also outline prospective strategies for enhancing the performance of SACs and C3N4-based SACs in the future.A comprehensive array of methodologies is presented for identifying and char-acterizing C3N4-based SACs.This includes an exploration of potential atomic catalytic mechanisms through the simulation and regulation of atomic catalytic behaviors and the synergistic effects of single or multiple sites.Subsequently,a forward-looking perspective is adopted to contemplate the future prospects and challenges associated with C3N4-based SACs.This encompasses considerations,such as atomic loading,regulatory design,and the integration of machine learn-ing techniques.It is anticipated that this review will stimulate novel insights into the synthesis of high-load and durable SACs,thereby providing theoretical groundwork for scalable and controllable applications in the field.
出处 《SusMat》 SCIE EI 2024年第5期70-113,共44页 可持续发展材料(英文)
基金 Key R&D Program of Hubei Province,Grant/Award Number:2022BAA084 National Natural Science Foundation of China,Grant/Award Number:62004143。
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