摘要
未来极紫外光刻技术的发展亟需更高功率的光刻光源,能量回收型自由电子激光光源可以实现千瓦量级以上的功率输出,是一种极具潜力的高功率极紫外光刻光源。主要介绍了高功率能量回收型自由电子激光光源的工作原理、发展现状以及所面临的关键技术挑战。
Significance Extreme ultraviolet(EUV)lithography technology is critical for realizing high-end chip manufacturing at the 7 nm node and below.Currently,EUV lithography machines mainly use laser plasma(LPP)light sources.The maximum EUV power achieved by an LPP light source is approximately 500 W.For nodes smaller than 3 nm,satisfying the power requirements of LPP light sources is difficult.The development of EUV lithography in the future will require more powerful light sources.A free-electron laser based on energy recovery linacs(ERL-FEL)can achieve a laser output with high repetition frequency,high average power,and high energy efficiency.With the development of FEL and ERL technologies,an ERL-FEL light source can achieve an output power of more than 10 kilowatts at a wavelength of 13.5 nm and is thus a promising high-power EUV lithography light source.Progress A free-electron laser is a type of radiation laser based on free electrons in vacuum.Compared with those of traditional lasers,the radiation wavelength does not depend on the excited medium but is related only to the electron beam energy and undulator magnetic field.An energy recovery linac accelerates the electron beams in the acceleration phase.After application,the accelerated electron beams return to the main accelerator during the deceleration phase and the power of the high-energy electron beam is converted into the microwave acceleration field power to accelerate the subsequent injected electron beams,which can achieve highefficiency energy recovery and utilization.The FEL light source based on ERL technology provides a new technical route for the development of high-power EUV lithography.Since Madey first proposed the concept of free-electron lasers in 1971,at least 50 FEL facilities have been built worldwide,and at least 20 FEL facilities are currently under construction or planned.In 1965,Tigner first proposed the concept of energy-recovery linacs.In recent decades,ERL technology has been regularly applied in different fields,and countries worldw
作者
周奎
李鹏
吴岱
黎明
Zhou Kui;Li Peng;Wu Dai;Li Ming(Institute of Applied Electronics,Chinese Academy of Engineering Physics,Mianyang 621900,Sichuan,China)
出处
《中国激光》
EI
CAS
CSCD
北大核心
2024年第7期105-113,共9页
Chinese Journal of Lasers
基金
国家自然科学基金(62205319)
中物院创新发展基金创新项目(CX20210046)。
关键词
激光光学
极紫外光刻
能量回收型直线加速器
自由电子激光
光阴极注入器
超导加速器
laser optics
extreme ultraviolet lithography
energy-recovery linacs
free electron laser
photocathode injector
superconducting accelerator
