摘要
Creation of arbitrary features with high resolution is critically important in the fabrication of nano-optoelectronic devices.Here,sub-50 nm surface structuring is achieved directly on Sb2S3 thin films via microsphere femtosecond laser irradi-ation in far field.By varying laser fluence and scanning speed,nano-feature sizes can be flexibly tuned.Such small patterns are attributed to the co-effect of microsphere focusing,two-photons absorption,top threshold effect,and high-repetition-rate femtosecond laser-induced incubation effect.The minimum feature size can be reduced down to~30 nm(λ/26)by manipulating film thickness.The fitting analysis between the ablation width and depth predicts that the feature size can be down to~15 nm at the film thickness of~10 nm.A nano-grating is fabricated,which demonstrates desirable beam diffraction performance.This nano-scale resolution would be highly attractive for next-generation laser nano-lithography in far field and in ambient air.
基金
This work is supported by Academic Research Fund Tier 2,Ministry of Education-Singapore(MOE2019-T2-2-147)
T.C.acknowledges support from the National Key Research and Development Program of China(2019YFA0709100,2020YFA0714504).
