摘要
光刻机是支撑集成电路芯片制程不断减小的关键设备,而高性能的光刻机需要高加速度和高精度的运动台作为支撑。为了达到光刻机的各项工作指标,高性能的运动台控制方法必不可少。本文针对光刻机运动台的主流控制方法进行了梳理和介绍,首先介绍了运动台的工作原理及基本控制架构,然后从前馈控制、反馈控制、冗余驱动/冗余测量等方面对运动台控制方法进行具体介绍,旨在为光刻机运动台控制方法的进一步发展提供参考。
A lithography machine is a key equipment to support the continuous reduction of the size of the integrated circuit.High-performance lithography machine requires high-acceleration and high-precision motion stages.To meet the requirements of the lithography machine,high-performance stage control methods are essential.This paper sorts out and introduces the mainstream control methods of motion stages in the lithography machine.First,the working principle and basic control structure of motion stages are introduced.Then,the control methods of the motion stage are introduced in detail from the aspects of feedforward control,feedback control and over-actuation/over-sensing,to provide a reference for the further development of control methods of lithography machine motion stages.
作者
姜龙滨
丁润泽
丁晨阳
杨晓峰
徐云浪
Jiang Longbin;Ding Runze;Ding Chenyang;Yang Xiaofeng;Xu Yunlang(Shanghai Engineering Research Center of Ultra-Precision Motion Control and Measurement,Academy for Engineering and Technology,Fudan University,Shanghai 200433,China;State Key Laboratory of ASIC and System,School of Microelectronics,Fudan University,Shanghai 200433,China)
出处
《激光与光电子学进展》
CSCD
北大核心
2022年第9期35-47,共13页
Laser & Optoelectronics Progress
基金
国家重点研发计划(2021YFA1200600)
中国博士后科学基金(2021TQ0070)
复旦大学专用集成电路与系统国家重点实验室开放基金(2021KF007)。
关键词
光刻机
运动台
前馈控制
反馈控制
lithography machine
motion stage
feedforward control
feedback control
