摘要
Antireflection layers are commonly used in photovoltaics to increase light absorption and therefore increase maximum photocurrent.Here,pyramid structures are created on Si surfaces with alkaline solution etching.The extent of pyramid coverage depends directly on the reaction time and as a result,the surface reflectance decreases with reaction time.
基金
The support of the Australian Research Council Discovery Program(DP150101354 and DP160101301)is gratefully acknowledged.
