摘要
采用离子束辅助磁控溅射技术制备CrTiAlCuN薄膜,利用扫描电镜(能谱仪)、X射线衍射仪、硬度计、划痕仪及磨擦磨损试验仪分析检测膜层的结构及主要力学性能.结果表明:所制备CrTiAlCuN膜层厚度约2.0μm,膜层细腻致密,呈典型的柱状晶生长;膜层中的主要元素是Cr,其含量占40%左右;膜层呈现出与CrN相近的晶体结构和晶格常数,晶格中部分Cr原子被Ti和Al替代;膜层的显微硬度达3255Hv,结合力为74N,而Cu的引入使摩擦系数降低至0.366,薄膜具有优良的综合性能.
CrTiAlCuN thin films were prepared by ion beam assisted magnetron sputtering.The structure and main mechanical properties of the film were analyzed by scanning electron microscope(energy spectrometer),X-ray diffractometer(XRD),hardness tester,scratch tester and friction and wear tester.The results show that the thickness of the prepared CrTiAlCuN film is about 2.0 m,and the film is fine and dense with typical columnar crystal growth.The main element in the film is Cr,the content of which accounts for about 40 at.%.The crystal structure and lattice constant of the film are similar to CrN film,and some of the Cr atoms in the crystal lattice are replaced by Ti and Al.The microhardness of the film is 3255 Hv,the binding force is 74 N,and the friction coefficient is reduced to 0.366 with the introduction of Cu.Finally,the film has excellent comprehensive properties.
作者
林松盛
杨建成
汪唯
郭朝乾
唐鹏
苏一凡
代明江
LIN Songsheng;YANG Jiancheng;WANG Wei;GUO Chaoqian;TANG Peng;SU Yifan;DAI Mingjiang(The Key Lab of Guangdong for Modern Surface Engineering Technology,National Engineering Laboratory for Surface Engineering Technology,Institute of New Materials,GuangdongAcademy of Sciences,Guangzhou 510650,China;QingYuan FuYing Electronics Co.,Ltd.,Qingyuan 511500,China)
出处
《材料研究与应用》
CAS
2021年第3期191-195,共5页
Materials Research and Application
基金
广东省重点领域研发计划项目(2020B010184001)
清远市科技计划项目(2020KJJH002)。
